涂层成份及结构的X射线光电子谱分析
来源期刊：中南大学学报(自然科学版)1994年第4期
论文作者：马柳莺 刘华佾 赖永玲 刘国纯
文章页码：480 - 484
关键词：化学涂层; 成分; 相; 物理化学涂层
Key words：chemical evaporation deposition; compostition; phase; physical-chemical evapo-ratio deposition
摘 要：以硬质合金作为衬底,分别采用了化学涂层(CVD)和物理化学涂层(PCVD)的技术涂复Ti(C,N)－TiN硬质膜,应用X射线光电子谱分析(XPS)技术,研究涂层表面化学成分、元素化学状态、物相组成及其随深度的变化.涂层表面由Ti,N,C,O和Co组成;表面物相包括TiN,TiOX及CoO.随着深度的增加,Ti：N迅速变为1,而TiOX和CoO含量急剧减少.
Abstract: The substrates were prepared from cemented carbide. Ti(C,N)-TiN coatings were car-ried out bv the chemical evaporation deposition(CVD)process and physical-chemical evapo-ration deposition(PCVD)process respectively.The chemical ingredient,the chemical stateof various elements and the phase composition,and their variation with the coat depth werestudied using X-ray photo-electron spectrometries.The surface phases include TiN,TiOxand CoO. Ti：N becomes 1;TiOx and CoO decrease quickly with the increase of the depth.
