Sputtering Deposition of Ultra-thin α-Fe2O3 Films for Solar Water Splitting
来源期刊：JOURNAL OF MATERIALS SCIENCE TECHNOLOG2015年第6期
论文作者：Lichao Jia Karsten Harbauer Peter Bogdanoff Kluas Ellmer Sebastian Fiechter
文章页码：655 - 659
摘 要：Ultra-thin α-Fe2O3（hematite） films have been deposited by radio frequency（RF） sputtering technique and photoelectrochemically investigated towards their ability to oxidize water.By varying the deposition power and time as well as the sputter gas flow（argon）,the microstructure and morphology of the film were optimized.It was found that the increment in the film thickness resulted in the loss of efficiency for solar water oxidation.The film with a thickness of 27 nm exhibited the best result with a maximum photocurrent of 0.25 mA cm-2 at 1.23 VRHE.Addition of small amounts of O2 to the sputter gas improved the photoactivity significantly.
Lichao Jia，Karsten Harbauer，Peter Bogdanoff，Kluas Ellmer，Sebastian Fiechter
摘 要：Ultra-thin α-Fe2O3（hematite） films have been deposited by radio frequency（RF） sputtering technique and photoelectrochemically investigated towards their ability to oxidize water.By varying the deposition power and time as well as the sputter gas flow（argon）,the microstructure and morphology of the film were optimized.It was found that the increment in the film thickness resulted in the loss of efficiency for solar water oxidation.The film with a thickness of 27 nm exhibited the best result with a maximum photocurrent of 0.25 mA cm-2 at 1.23 VRHE.Addition of small amounts of O2 to the sputter gas improved the photoactivity significantly.
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