Diffusion kinetics of nitrogen in tantalum during plasma-nitriding

来源期刊：中国有色金属学报(英文版)2001年第2期

论文作者：张德元 林勤 曾卫军 李放 许兰萍 付青峰

文章页码：281 - 282

Key words：tantalum; nitrogen; diffusion activation energy

Abstract: The activation energies of nitrogen in tantalum on plasma nitriding conditions were calculated according to the experimental data of hardness of plasma-nitriding of tantalum vs time and temperature. The activation energy calculated is 148.873±0.390 kJ/mol. The depth increasing of nitriding layer with time follows square root relation. The nitriding process of tantalum is controlled by diffusion of nitrogen atoms in tantalum solid solution.