简介概要

MEVVA磁过滤等离子技术制备的Fe纳米颗粒薄膜结构

图书来源:二元合金相图及中间相晶体结构 二元合金相图及中间相晶体结构

作 者:唐仁政 田荣璋

出版时间:2009-05

定 价:320元

图书ISBN:978-7-81105-831-4

出版单位:中南大学出版社

详情信息展示

Design of Slant-Form Tool in Precision Reuse of Digital Paper Display

Pai-Shan Pa Department of Digital Content Design, Graduate School of Toy and Game Design, National Taipei University of Education, Taipei 10667, Taiwan, China

摘 要:A reuse fabrication module using micro electroetching as a precision machining process with a new design of a slant-form tool to remove the defective indium-tin-oxide (ITO) nanostructure from the optical poly- ethyleneterephthalate (PET) surfaces of digital paper display is presented in current studies. The low yield of ITO thin film deposition is an important factor in optoelectronic semiconductor production. The adopted precision reuse process requires only a short period of time to remove the ITO nanostructure easily and cleanly, which is based on technical and economical considerations and is highly effcient. In the current experiment, a large inclined angle of the cathode and a small end radius of the anode take less time for the same amount of ITO removal. A higher feed rate of the optical PET diaphragm combines with enough electric power to drive fast micro electroetching. A small rotational diameter of the anode accompanied by a small width of the cathode corresponds to a higher removal rate for the ITO nanostructure. A pulsed direct current can improve the effect of dreg discharge and is advantageous to couple this current with the fast feed rate of the workpiece. This improvement is associated with an increase in current rating. High rotational speed of the slant-form tool can improve the effect of dregs discharge and is advantageous to associate with the fast feed rate of the workpiece (optical PET diaphragm).

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