Deposition of chromium aluminum nitride coatings by arc ion plating
来源期刊：中国有色金属学报(英文版)2007年增刊第1期(Part ⅡB)
论文作者：张淑娟 李明升 冯长杰 刘庭芝 多树旺
文章页码：780 - 784
Key words：chromium aluminum nitride; arc ion plating; phase change; pulse bias
Abstract: Cr-Al-N ternary coatings were deposited by arc ion plating method using isolated Cr target and Al target. The influence of AlN content on the phase change was studied by synthesizing Cr1-xAlxN coatings with different x values. The effects of substrate negative bias on the surface morphology, deposition rate and phase structure were investigated. As the aluminum content increases, the structure of (Cr1-xAlx)N changes from B1(NaCl) phase to B4(wurtzite) phase. The critical content of AlN solubilized in B1(NaCl) lattice is close to 0.7. With the increasing pulse negative bias, the deposition rate decreases constantly, the droplet contamination is more serious, the ion-etching effect on coating surface is more obvious, and the change of preferred orientation and the shift of XRD peak take place.
基金信息：the National Natural Science Foundation of China
the Natural Science Foundation of Jiangxi Province, China
