CARBON NITRIDE FILMS PREPARED AT DIFFERENT N2/Ar RATIOS BY CLOSED FIELD UNBALANCED REACTIVE MAGNETRON SPUTTERING
来源期刊：Acta Metallurgica Sinica2005年第3期
论文作者：Y.G. Shen Z.F. Zhou K.Y. Li A. Vyas
Key words：carbon nitride; X-ray photoelectron spectroscopy; Raman spectroscopy; pin-on disc wear test; tribology;
Abstract: Carbon nitride (CNx) thin films have been deposited onto Si(100) (for structural and mechanical analyses) and M42 high-speed-steel (for tribological measurements) substrates at room temperature by closed-field unbalanced magnetron sputtering. The mechanical and tribological properties of these films were highly dependent on the N/C concentration ratio that was adjusted by the F(N2)/F(Ar) flow-rate ratio at fixed substrate biasing of -60V during deposition. The films were characterized by employing scanning electron microscopy (SEM), atomic force microscopy(AFM), nano-indentation measurements, X-ray photoelectron spectroscopy (XPS), Raman scattering and Fourier transform infrared (FTIR) spectroscopy, pin-on-disc tribometer, scratch tester, and Rockwell-C tester. The results showed that the N content in the films increased with the N2 pressure. However, the maximum N/C ratio obtained was 0.25. The nanohardness was measured to be in the range of 11.7-20.8GPa depending on the N/C ratios. The XPS N 1s spectra showed the existence of both N-C sp2 and N-C sp3 bonds in films. Raman and FTIR spectra exhibited that N-C bonds were fewer when compared to other N-C bonds. The friction coefficient of the film deposited onto steel substrate with N/C=0.26 was measured to be ～0.08and for film with N/C=0.22 a high critical load of 70N was obtained. The tribological data also showed that the wear rates of these films were in the range of～10-16m3/Nm, indicating excellent wear resistance for CNxfilms.
Y.G. Shen1，Z.F. Zhou1，K.Y. Li1，A. Vyas1
(1.Department of Manufacturing Engineering and Engineering Management (MEEM), City University of Hong Kong, Kowloon, Hong Kong, China)
Abstract:Carbon nitride (CNx) thin films have been deposited onto Si(100) (for structural and mechanical analyses) and M42 high-speed-steel (for tribological measurements) substrates at room temperature by closed-field unbalanced magnetron sputtering. The mechanical and tribological properties of these films were highly dependent on the N/C concentration ratio that was adjusted by the F(N2)/F(Ar) flow-rate ratio at fixed substrate biasing of -60V during deposition. The films were characterized by employing scanning electron microscopy (SEM), atomic force microscopy(AFM), nano-indentation measurements, X-ray photoelectron spectroscopy (XPS), Raman scattering and Fourier transform infrared (FTIR) spectroscopy, pin-on-disc tribometer, scratch tester, and Rockwell-C tester. The results showed that the N content in the films increased with the N2 pressure. However, the maximum N/C ratio obtained was 0.25. The nanohardness was measured to be in the range of 11.7-20.8GPa depending on the N/C ratios. The XPS N 1s spectra showed the existence of both N-C sp2 and N-C sp3 bonds in films. Raman and FTIR spectra exhibited that N-C bonds were fewer when compared to other N-C bonds. The friction coefficient of the film deposited onto steel substrate with N/C=0.26 was measured to be ～0.08and for film with N/C=0.22 a high critical load of 70N was obtained. The tribological data also showed that the wear rates of these films were in the range of～10-16m3/Nm, indicating excellent wear resistance for CNxfilms.
Key words:carbon nitride; X-ray photoelectron spectroscopy; Raman spectroscopy; pin-on disc wear test; tribology;
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