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• CARBON NITRIDE FILMS PREPARED AT DIFFERENT N2/Ar RATIOS BY CLOSED FIELD UNBALANCED REACTIVE MAGNETRON SPUTTERING

  来源： 《Acta Metallurgica Sinica2005年第3期》——Y.G. Shen Z.F. Zhou K.Y. Li A. Vyas

  CARBON NITRIDE FILMS PREPARED AT DIFFERENT N2/Ar RATIOS BY CLOSED FIELD UNBALANCED REACTIVE MAGNETRON SPUTTERING Y.G. Shen1,Z.F. Zhou1,K.Y. Li1,A. Vyas1 (1.Department of Manufacturing Engineering... analyses) and M42 high-speed-steel (for tribological measurements) substrates at room temperature by closed-field unbalanced magnetron sputtering. The mechanical and tribological properties......

• Fabrication and its characteristics of hard coating Ti-Al-N system prepared by DC magnetron sputtering

  来源： 《Rare Metals2012年第2期》——ZHOU Xuyang a , WU Aimin a, b , QU Wenchao a, b , and JIANG Xin c a School of Materials Science and Engineering, Dalian University of Technology, Dalian , China b Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Ministry of Education, Dalian University of Technology, Dalian , China c Institute of Materials Engineering, University of Siegen, Paul-Bonatz-Stra e -, D- Siegen, Germany

  Al x N films were synthesized on Si (100) wafer by DC magnetron sputtering method using Ti 1 x Al x alloy targets with different Al contents. The composition of the Ti 1 x Al x N films was determined...Fabrication and its characteristics of hard coating Ti-Al-N system prepared by DC magnetron sputteringZHOU Xuyang a , WU Aimin a, b , QU Wenchao a, b , and JIANG Xin c a School of Materials Science......

• 反应磁控溅射法高速低温沉积锐钛矿相TiO₂薄膜的结构与光学性能

  来源： 《金属学报2010年第1期》——李铸国 三宅正司

  反应磁控溅射法高速低温沉积锐钛矿相TiO2薄膜的结构与光学性能李铸国1,三宅正司2(1.上海市上海交通大学材料科学与工程学院上海激光制造与材料改性重点实验室2.近畿大学,大阪 5778502,日本)摘 要:采用诱导型耦合等离子体辅助直流磁控溅射法在石英玻璃片上反应沉积TiO2薄膜,通过X射线衍射(XRD),透射电子显微镜(TEM)和紫外可见光谱(UV-Vis)对薄膜特性进行表征.结果表明,叠加诱导型耦合等离子体和局部富氧增加了等离子体的反应活性,在金属溅射模式和低于200℃的沉积条件下,制备了高质量的锐钛矿相T......

• Structure and electronic properties of SiC thin-filmsdeposited by RF magnetron sputtering

  来源： 《中国有色金属学报(英文版)2007年第2期》——周继承 郑旭强

  Structure and electronic properties of SiC thin-films deposited by RF magnetron sputtering ZHOU Ji-cheng(周继承), ZHENG Xu-qiang(郑旭强) School of Physics Science and Technology, Central South...;          Abstract: SiC thin-films were prepared by RF-magnetron sputtering technique(RMS) with the target of single crystalline SiC and then annealed......

• Enhance of TiO₂ dopants incorporated reduced graphene oxide via RF magnetron sputtering for efficient dye-sensitised solar cells

  来源： 《Rare Metals2018年第11期》——Foo Wah Low Chin Wei Lai Kian Mun Lee Joon Ching Juan

  Enhance of TiO2 dopants incorporated reduced graphene oxide via RF magnetron sputtering for efficient dye-sensitised solar cellsFoo Wah Low,Chin Wei Lai,Kian Mun Lee,Joon Ching JuanNanotechnology... potential in the rational energy conversion efficiency to secure our sustainable energy source.In the present study, advanced radio frequency(RF) magnetron sputtering technique was applied to incorporate......

• 磁控溅射Al-Zr薄膜在微拉深成形中的拉深性能

  来源： 《中国有色金属学报(英文版)2012年第z2期》——Gerrit BEHRENS Julien KOVAC Bernd KÖHLER Frank VOLLERTSEN Heinz-Rolf STOCK

  to the micro range. Two different foils out of the Al-Zr alloy with a thickness of about 15 μm were manufactured using a magnetron-sputtering process by applying substrate temperatures of 310 K and 433 K... achievable limit drawing ratio. This illustrates the good suitability of magnetron sputtering as a foil manufacturing process for micro sheet forming operations. Key words: Al-Zr foil; micro deep drawing......

• Fabrication of NiO Buffer Layer for YBCO Coated Conductors by Combining Sputtering and SOE Method

  来源： 《JOURNAL OF RARE EARTHS2004年增刊第2期》——Yang Haitao Yuan Guansen Wang Xiaohua LIU Huizhong Yang Jian Gu Hongwei

  was first deposited on the tapes via magnetron sputtering. Then on the coating tapes, continuous and textured NiO layer were achieved by SOE technology. Key words:YBCO; coated conductor; buffer layers; SOE...Fabrication of NiO Buffer Layer for YBCO Coated Conductors by Combining Sputtering and SOE Method Yang Haitao1,Yuan Guansen2,Wang Xiaohua1,LIU Huizhong2,Yang Jian2,Gu Hongwei2 (1.National Center......

• 类金刚石/碳化钨多层膜的制备及其结构

  来源： 《中国有色金属学报2013年第2期》——林松盛 周克崧 代明江

  , China;2. Department of New Materials, Guangzhou Research Institute of Non-ferrous Metals,)Abstract:Anodic gas ion beam source (IBS) and unbalance magnetron sputtering (UBM) were employed to deposit... that the main features, which are very similar to the DLC film.Key words:diamond-like carbon/WC multilayer films; microstructure; ion source; unbalanced magnetron sputtering......

• Influence of TiO₂ seeding layers on phase composition of lead magnesium niobate-lead titanate thin films prepared by RF magnetron sputtering

  来源： 《Rare Metals2007年第S1期》——WANG Junming,LI Weili,and FEI Weidong School of Materials Science & Engineering,Harbin Institute of Technology,Harbin ,China

  of lead magnesium niobate-lead titanate(0.7Pb(Mg1/3Nb2/3)O3-0.3PbTiO3,PMN-PT) films deposited on Pt/Ti/SiO2/Si substrate by RF magnetron sputtering was examined.The relation between seeding layer thickness...Influence of TiO2 seeding layers on phase composition of lead magnesium niobate-lead titanate thin films prepared by RF magnetron sputteringWANG Junming,LI Weili,and FEI Weidong School of Materials......

• Preparation and optoelectronic properties of a-IGZO thin films deposited by RF magnetron sputtering at different working pressures

  来源： 《Rare Metals2018年第7期》——Rui-Xin Ma Yu-Qin Xiao Shi-Na Li Yuan-Yuan Wang Dong-Ran Li Liang-Wei He

  Preparation and optoelectronic properties of a-IGZO thin films deposited by RF magnetron sputtering at different working pressuresRui-Xin Ma,Yu-Qin Xiao,Shi-Na Li,Yuan-Yuan Wang,Dong-Ran Li,Liang-Wei... were prepared by high-vacuum RF magnetron sputtering at different working pressures. The effect of working pressure on crystal structure, surface morphology, and electrical and optical properties......