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La1/3NbO3(LN) and tantalate La1/3TaO3(LT)transparent thin films(200 nm thickness) prepared by chemical solution deposition on Pt/SiO2/Si substrates were described. The precursors and films were analyzed...Structural and mechanical properties of La1/3NbO3 and La1/3TaO3 thin films prepared by chemical solution depositionHelena Brunckova1,Lubomir Medvecky1,Alexandra Kovalcikova1,Martin Fides1,Erika......
La1/3NbO3(LN) and tantalate La1/3TaO3(LT)transparent thin films(200 nm thickness) prepared by chemical solution deposition on Pt/SiO2/Si substrates were described. The precursors and films were analyzed...Structural and mechanical properties of La1/3NbO3 and La1/3TaO3 thin films prepared by chemical solution depositionHelena Brunckova1,Lubomir Medvecky1,Alexandra Kovalcikova1,Martin Fides1,Erika......
Metallurgy, Central South University, Changsha 410083, China) Abstract: ZrC coating was prepared by atmospheric pressure chemical vapor deposition (APCVD) with ZrCl4-CH4-H2-Ar chemical system at different... coating is typical needle-like. When temperature rises up to 1 873 K, crystalline shows short-column, coating is compact as well as smooth, and deposition rate is highest. Key words: chemical vapor......
of super-hydrophobic film deposited on magnesium alloy AZ31 by microwave plasma-enhanced chemical vapor deposition [J]. Electrochimica Acta, 2010, 55(23): 7094–7101. [8] EZHILSELVI V, NITHIN J, BALARAJU J N... J. Cent. South Univ. (2018) 25: 2962-2970 DOI: https://doi.org/10.1007/s11771-018-3966-6 Spray deposition of FeCrNiMn and high carbon steel coatings by thermite reaction CHEN Gang(陈刚)1, SHEN Shu......
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prepared by chemical vapor deposition(CVD) alternated with slurry painting were applied on C/C-SiC composites, respectively. The oxidation of three samples at 1 500 ℃ was compared. The results show... Si-Mo layer. Porous Si-Mo layer improves the thermal shock resistance of the coating.
Key words: C/C-SiC composites; oxidation protective coating; slurry painting; chemical vapor deposition
, such as ball milling, electrodeposition, decomposition of Ni(CO)4, chemical vapor deposition(CVD) and wet chemical process[9-14]. However, it is difficult to obtain the ultrafine nickel powders... Preparation of ultrafine nickel powder by wet chemical process CHEN Rui-ying(陈瑞英), ZHOU Kang-gen(周康根) School of Metallurgical Science and Engineering, Central South University, Changsha 410083......
substrate by the normal pressure chemical vapor deposition using CH3SiCl3 (MTS) as a source precursor at 1 150 ℃. But the hexagonal Al4SiC4 phase was generated in the doped process with trimethylaluminium... Al/SiC solid solution at 1 150 ℃ in a normal argon atmosphere is not produced. Key words: silicon carbide; aluminum doping; dielectric properties; chemical vapour deposition 1 Introduction Silicon......
:ZrC涂层;温度;低压;化学气相沉积 中图分类号:TQ050.4 文献标志码:A Character of ZrC film prepared by transporting solid ZrCl4 during low pressure chemical vapor deposition LIU Gang, LI Guo-dong, XIONG Xiang, WANG Ya-lei, CHEN Zhao-ke, SUN Wei (State Key Laboratory of Powder Metallurgy, Central South University, Changsha 410083, China) Abstract: ZrC film was deposited by chemical vapor deposition......
as the fiber/matrix interphase layer by chemical vapor deposition (CVD) technique. Fiber/matrix debonding and relatively long fiber pullouts were observed on the fracture surfaces. Additionally, the flexural... in the deposition of BN interface coatings on SiC fibers by chemical vapor deposition [J]. Surface & Coatings Technology, 2006, 201: 2741-2748. [19] IGAWA N, TAGUCHI T, YAMADA R, ISHII Y, JITSUKAWA S......