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oxidation is high. As the reaction progresses, the thickness of the aluminum oxide film formed on the AlN surface gradually increases, which hinders the contact between O2 and AlN, and the diffusion rate......
of CARALL specimens. And an adhesive layer (structural adhesive film J-271, Institute of Petrochemistry Heilongjiang Academy of Sciences) was included at each composite-metal interface according......
controlled by film diffusion in some cases [21]. It can be seen from Fig. 7 that the plots of qt versus t1/2 did not pass through the origin. Hence, intraparticle diffusion is not the only rate......
of passive film and resulted in a weakened corrosion barrier to protect the substrate during tests. Figure 6 Tafel curves (a), Nyquist EIS spectra (b), fitted equivalent circuit (c), bode diagrams (d) of Fe......
coefficient of the samples show a downward trend. Because the hardness of Ti185 is much smaller than that of the grinding ball GCr15, the initial film layer is easily damaged during the grinding process......
strain directions on the phase transformation of zirconium film by MD method. In this study, MD simulation was used to study the effect of temperature on the microstructure and mechanical performance... in the strained ultrathin copper film: A molecular dynamic simulation study [J]. Materials Chemistry and Physics, 2019, 223: 171-182. DOI: 10.1016/j.matchemphys.2018.09.045. [35] TANG F, JIAN Z, XIAO S, LI X, HU W......
Pu-yu, CHEN Zong-kun, HUANG Ming-hua. An electrodeposited cobalt–selenide-based film as an efficient bifunctional electrocatalyst for full water splitting [J]. Journal of Materials Chemistry A, 2016......
, 28(8): 2436-2450. DOI: https://doi.org/10.1007/s11771-021-4778-7. 1 Introduction The semiconductor manufacturing process is complex, precise and requires multiple processes, such as film deposition......
DOI:10.19476/j.ysxb.1004.0609.2019.09.13 能源光电转换与大规模储能二次电池关键材料的研究进展 梁叔全1,程一兵2, 3,方国赵1,曹鑫鑫1,沈文剑2,钟 杰2,潘安强1,周 江1 (1. 中南大学 材料科学与工程学院,长沙 410083； 2. 武汉理工大学 材料复合新技术国家重点实验室,武汉 430070； 3. Department of Materials Engineering, Faculty of Engineering, Monash University, VIC3800, Australia) 摘 要......
influences etch rate by its microstructure, film stress, impurities in or on the material itself. VARTULI[70] reported a decrease in etch rates with increasing crystal quality, as the reactions occurred......
