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Electroless copper plating on microcellular polyurethane foam TIAN Qing-hua(田庆华), GUO Xue-yi(郭学益) School of Metallurgical Science and Engineering, Central South University, Changsha 410083, China... with good conductive foam for high porosity foam metal materials used in the metal electrodes, the technique of electroless copper plating on the microcellular polyurethane foam with pore size of 0.3 mm......
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Microstructure and mechanical properties of Ti6Al4V powder compacts prepared by magnetic pulse compaction LI Min(李 敏), YU Hai-ping(于海平), LI Chun-feng(李春峰) School of Materials Science...; Abstract: Ti6Al4V powder compaction was performed by using magnetic pulse compaction in air at 200......
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words: pulse jet electrodeposition; nickel film; corrosion resistance; mechanical property ..., the substrates were activated in diluted HCl solution. The pulse electrodeposition was performed using rectangular cathode current pulses as shown in Fig.2. The nanocrystalline nickel films were prepared......
Ni-P-Nanodiamond composite electroless platingYongwei ZHU*,Yongjun CHEN and Changhong ZHU College of Mechanical and Electrical Engineering,Nanjing University of Aeronautics and Astronautics,Nanjing 210016,China Xiangqian SHEN School of Materials Science and Technology,Jiangsu University,Zhenjiang 21......
carbide) composite inert anodes were prepared on aluminum alloy substrate by double pulse electrodeposition (DPE) of PANI and WC particles with Pb2+ from an original plating bath. Thereafter, anodic... was about 1.0. The waveforms of DPE supply used for electrodepositing the composite inert anode from the original plating bath were as follows: forward and reverse pulse duty cycles were 10% and 30......
Trans. Nonferrous Met. Soc. China 22(2012) s729-s734 Synthesis and properties of Cr-Al-Si-N films deposited by hybrid coating system with high power impulse magnetron sputtering (HIPIMS) and DC pulse... with high power impulse magnetron sputtering (HIPIMS) and a DC pulse sputtering using Cr and AlSi targets under N2/Ar atmosphere. By varying the sputtering current of the AlSi target in the range of 0-2.5......
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Composition Gradient Hard Coatings by Arc Ion Plating LIN Guo-qiang1,CHEN Jun2,WANG Fu-gang2 (1.State Key Laboratory for Materials Modification, Dalian , China;2.Department of material engineering of Dalian University of Technology, Dalian , China) 摘要:Arc Ion Plating can be used to synthesize multi-component composition gradient hard coatings by adjusting arc currents of metal targets......
