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A hydrometallurgical method of energy saving type for separation of rare earth elements from rare earth polishing powder wastes with middle fraction of ceriaUM Namil1,HIRATO Tetsuji21. Resource...="ChDivSummary">This study described a hydrometallurgical method to investigate the separation of rare earth elements(REEs)from rare earth polishing powder wastes(REPPWs)containing large amounts......
of Aeronautics and Astronautics, Beijing 100083, China) Abstract:The etching technique using Ce is a convenient and fast method for polishing and shaping diamond films. In this study, the influence of polishing parameters such as polishing temperature and time on the surface crystallinity and phase composition of diamond films was thoroughly investigated via the analysis of Raman spectra......
J. Cent. South Univ. Technol. (2011) 18: 259-265 DOI: 10.1007/s11771-011-0688-4 Evolution of aggregate surface texture due to tyre-polishing CHEN Xian-hua(陈先华)1, B. STEINAUER2, WANG Da-wei(王大为... measured and their developments in polishing process were monitored. The characterizations of height distribution and power spectral density of aggregate surface texture were estimated. The changes......
; inorganic non-metallic materials; orthorhombic LiMnO2; solid-state reaction; electro-chemical behavior; [全文内容正在添加中] ......
is advantageous for epitaxial growth and device making-up. Key words: sapphire; substrate; surface treatment; chemical mechanical polishing; slurry 1 Introduction Sapphire (α-Al2O3) single crystal... such as chemical mechanical polishing (CMP) may produce high quality surface finishes at low cost and with fast material removal rates [6]. CMP has been widely and effectively applied to a variety......
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to surface quality, but the surface removal rate will be lower. So, the higher speed is supposed to be selected in rough polishing process to obtain higher removal rate, while the lower speed should be selected in fine polishing process to gain higher surface quality.
Key words: magnetic head; lapping; polishing; removal rate
Nanotopography Impact in Shallow Trench Isolation Chemical Mechanical Polishing-Dependence on Slurry Characteristics
Takeo Katoh1,Ungyu Paik2,Jea-Gun Park1
(1.Nano-SOI Process Laboratory,Hanyang... of the surface of silicon wafers has become an important issue in ULSI device manufacturing since it affects the post-chemical mechanical polishing (post-CMP) uniformity of the thickness deviation......Nanotopography Impact in Shallow Trench Isolation Chemical Mechanical Polishing-Dependence on Slurry Characteristics
来源： 《JOURNAL OF RARE EARTHS2004年增刊第2期》——Takeo Katoh Ungyu Paik Jea-Gun Park
Trans. Nonferrous Met. Soc. China 30(2020) 1582-1593 Stress-induced martensite phase transformation of FeMnSiCrNi shape memory alloy subjected to mechanical vibrating polishing Shu-yong JIANG1, Yu WANG2, Xiao-dong XING1, Yan-qiu ZHANG1 1. College of Mechanical and Electrical Engineering, Harbin Engineering University, Harbin 150001, China; 2. College of Materials Science and Chemical Engineering......
CVD金刚石膜的机械抛光加工研究 匡同春1,白晓军1,郭钟宁1,王成勇1,余忠民2 (1.广东工业大学,广州 510090;2.广东省机械研究所,广州,510630) 摘要:在简要综述CVD金刚石膜光整加工方法的基础上,在自动抛磨机上对CVD金刚石厚膜进行了初步的机械抛光工艺研究,借助扫描电子显微镜(SEM)对抛光前后及抛光过程中CVD金刚石膜的表面形貌变化进行了观察,初步讨论了CVD金刚石的去除过程. 关键词:CVD金刚石膜; 机械抛光; 表面形貌; chemically vapor deposited diamond film; mechanical polishing; surface morphology; [全文内容正在添加中] ......
