共搜索到1158条信息,每页显示10条信息,共116页。用时:0小时0分0秒353毫秒
类号:O 484 文献标识码:A Effects of sputtering pressure on electrical and optical properties of transparent conducting ZnO thin film ZHOU Ji-cheng, LI Li (School...) magnetron sputtering method. The influences of pressure on the surface morphology, the electrical and optical properties were studied by AFM, XRD, UV-Vis spectrophoto meter and four-probe method......
Structure and Properties of TiO2-CeO2 Films Deposited on Soda-Lime Silicate Glass Substrates by R.F.Magnetron Sputtering Zhao Qingnan1,Ni Jiamiao1,Zhang Naizhi1,Jiang Hong2,Wang Guirong2,ZHAO... 471009, China) Abstract:TiO2-CeO2 films were deposited on soda-lime glass substrates at different ratio of O2 to Ar (0.10, 0.15,0.20) by R. F. magnetron sputtering. The structure, surface composition, UV......
Microstructure and Mechanical Property of Magnetron Sputtering Deposited DLC Film孙泽1,2,ZHAO Wen1,孔德军11. School of Mechanical Engineering, Changzhou University2. College of Mechanical Engineering, Donghua University摘 要:A diamond-like carbon(DLC) film was deposited on YT14 substrate using magnetron sputtering(MS). The surface morphologies, roughness......
......
Influence of Sputtering Pressure on the Structure and Mechanical Properties of Nanocomposite Ti-Si-N Thin FilmsVipin Chawla1,2,R.Jayaganthan1,Ramesh Chandra21. Department of Metallurgical...="ChDivSummary" name="ChDivSummary">Nanocomposite Ti-Si-N thin films have been deposited on Si (100) substrate by direct current/radio frequency (DC/RF) magnetron sputtering. The effect of varying deposition......
......
反应磁控溅射法高速低温沉积锐钛矿相TiO2薄膜的结构与光学性能李铸国1,三宅正司2(1.上海市上海交通大学材料科学与工程学院上海激光制造与材料改性重点实验室2.近畿大学,大阪 5778502,日本)摘 要:采用诱导型耦合等离子体辅助直流磁控溅射法在石英玻璃片上反应沉积TiO2薄膜,通过X射线衍射(XRD),透射电子显微镜(TEM)和紫外可见光谱(UV-Vis)对薄膜特性进行表征.结果表明,叠加诱导型耦合等离子体和局部富氧增加了等离子体的反应活性,在金属溅射模式和低于200℃的沉积条件下,制备了高质量的锐钛矿相T......
Trans. Nonferrous Met. Soc. China 24(2014) 2559-2565 Microstructures of TiN, TiAlN and TiAlVN coatings on AISI M2 steel deposited by magnetron reactive sputtering Cui-feng WANG1, Shih-fu OU2, Shi... and TiAlVN coatings were deposited on AISI M2 high-speed steels by magnetron reactive sputtering. The microstructures of all the coatings were characterized by X-ray diffraction (XRD), scanning......
......
prepared byusing r.f. magnetron sputtering onto glass substrate. The effect of sputtering param-eters, including Ar gas pressure and input rf power, on the structure and magneticproperties....%, however, saturation magnetizationwas much smaller than its calculation value. Key words:Fe-Cu thin film; magnetic property; sputtering condition; nano-crystalline; [全文内容正在添加中] ......