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471009, China) Abstract:TiO2-CeO2 films were deposited on soda-lime glass substrates at different ratio of O2 to Ar (0.10, 0.15,0.20) by R. F. magnetron sputtering. The structure, surface composition, UV...Structure and Properties of TiO2-CeO2 Films Deposited on Soda-Lime Silicate Glass Substrates by R.F.Magnetron Sputtering Zhao Qingnan1,Ni Jiamiao1,Zhang Naizhi1,Jiang Hong2,Wang Guirong2,ZHAO......
Structure and Properties of Ti-Si-N Coatings Synthesized by Combining Cathode Arc and Middle-frequency Magnetron Sputtering杨种田1,付德君21. College of Science, China Three Gorges University2. Accelerator... synthesized on a novel combining cathode and middle-frequency magnetron sputtering system, designed on an industrial scale. Ti was produced from the arc target and Si from magnetron target during......
Characteristics of the Structure and Properties of ZnSnO3 Films by Varying the Magnetron Sputtering ParametersFa-Yu Wu1,Jian-Wei Li1,Yi Qi2,Wu-Tong Ding3,Yuan-Yuan Guo1,Yan-Wen Zhou11. Laser Advanced... Science and Engineering, Shenyang University of Technology摘 要:Transparent conductive oxide ZnSnO3 films were prepared by radio-frequency magnetron......
Tungsten Doped Indium Oxide Thin Films Deposited at Room Temperature by Radio Frequency Magnetron SputteringJiaojiao Pan,Wenwen Wang,Dongqi Wu,Qiang Fu,Ding MaDepartment of Physics,Beihang University摘 要:Tungsten doped indium oxide(IWO) thin films were deposited on glass substrate at room temperature by radio frequency reactive magnetron......
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ZnO:Al Films Prepared by Reactive Mid-frequency Magnetron Sputtering with Rotating CathodeRuijiang Hong 1) and Shuhua Xu 2) 1) School of Physics and Engineering,Sun Yat-sen University,Guangzhou... substrates using a reactive mid-frequency (MF) magnetron sputtering process with rotating cathodes.The influence of deposition parameters on structural,electrical and optical properties of AZO films......
ITO Films Prepared by Long-throw Magnetron Sputtering without Oxygen Partial PressureMiaoju Chuang Institute of Mechatronoptic Systems,Chienkuo Technology University,Changhua City 500,Taiwan,China摘 要..., which were prepared by long-throw rf magnetron sputtering technique at room temperature. For 200 nm thick ITO films grown at room temperature in pure argon pressure of 0.27 Pa and sputtering power of 40......
Properties of Gallium Phosphide Thick Films Prepared on Zinc Sulfide Substrates by Radio-Frequency Magnetron SputteringYangping Li and Zhengtang Liu School of Materials Science and Engineering, Northwestern Polytechnical University, Xi an 710072, China摘 要:Radio-frequency (RF) magnetron sputtering was employed to prepare gallium phosphide (GaP) thick......
SnOx Thin Films Deposited by Reactive Magnetron Sputtering for Microbatteries Anodes SHEN Wan1,YANG Zhi-min1,DU Jun1,MAO Chang-hui1,XING Guang-jian1 (1.Research Center of Energy Materials... reactive magnetron sputtering. The SnOx films are characterized by X-ray diffraction ( XRD ) and X-ray photoelectron spectroscopy(XPS). Influences of deposition conditions such as oxygen partial......
Characteristic comparison of metal films coated onto the cenosphere by chemical and magnetron sputtering methodsXU Zheng1), YU Xiaozheng2), CAI Chujiang2), and SHEN Zhigang2) 1) General Research... cenospheres and is easy to peel off. However, the metal film prepared by magnetron sputtering is compact, smooth and without pin holes. The film has good affinity to the cenosphere surface. Such films......