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Microstructure and Mechanical Property of Magnetron Sputtering Deposited DLC Film孙泽1,2,ZHAO Wen1,孔德军11. School of Mechanical Engineering, Changzhou University2. College of Mechanical Engineering, Donghua University摘 要:A diamond-like carbon(DLC) film was deposited on YT14 substrate using magnetron sputtering(MS). The surface morphologies, roughness......
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; Abstract: GeSb2Te4 films were deposited on Si substrates by RF magnetron sputtering, and the effects of sputtering power on the surface topography and anti-compression... were deposited on Si(111) substrates by RF magnetron sputtering equipment, and the compound target with 60 mm in diameter was provided by Mitsubishi Corporation. Two groups of samples were prepared......
) magnetron sputtering method. The influences of pressure on the surface morphology, the electrical and optical properties were studied by AFM, XRD, UV-Vis spectrophoto meter and four-probe method... ℃ for 300 s under N2 ambient, the lowest resistivity is 10?2 Ω·cm. Key words: radio-frequency magnetron sputtering; ZnO thin film; sputtering pressure; transparent conducting thin film ......
Effect of process parameters on electrical, optical properties of IZO films produced by inclination opposite target type DC magnetron sputtering Do-Hoon SHIN1, Yun-Hae KIM2, Joong-Won...; Abstract: IZO films were deposited onto PET substrate at room temperature with the inclined opposite target type DC magnetron sputtering equipment, in which a sintered oxide......
Microstructure and Properties of the Cr–Si–N Coatings Deposited by Combining High-Power Impulse Magnetron Sputtering(HiPIMS) and Pulsed DC Magnetron SputteringTie-Gang Wang1,2,Yu Dong1,Belachew Abera... sputtering and pulsed DC magnetron sputtering. The Si content in the coating was adjusted by changing the sputtering power of the Si target.By virtue of electron-probe microanalysis, X-ray diffraction......
Influence and determinative factors of ion-to-atom arrival ratio in unbalanced magnetron sputtering systemsJun Zhou, Zhe Wu, and Zhanhe Liu School of Aeronautic Science and Technology, Beijing... at the condensing surface is one of the main directions of development of magnetron sputtering methods. Unbalanced magnetron sputtering, by producing dense secondary plasma around the substrate, provides a high......
Trans. Nonferrous Met. Soc. China 22(2012) 104-110 Mechanical properties of hydroxyapatite-zirconia coatings prepared by magnetron sputtering KONG De-jun, LONG Dan, WU Yong-zhong, ZHOU Chao-zheng... and 75HA-25ZrO2 are (-399.1±3.0) MPa, (-343.2±20.3) MPa, respectively, as a result, the appropriate increase of HA contents in the coating will reduce its residual stress. Key words: magnetron sputtering; zirconia......
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Trans. Nonferrous Met. Soc. China 22(2012) s729-s734 Synthesis and properties of Cr-Al-Si-N films deposited by hybrid coating system with high power impulse magnetron sputtering (HIPIMS) and DC pulse... with high power impulse magnetron sputtering (HIPIMS) and a DC pulse sputtering using Cr and AlSi targets under N2/Ar atmosphere. By varying the sputtering current of the AlSi target in the range of 0-2.5......
