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Magnetic force improvement and parameter optimization for magnetic abrasive polishing of AZ31 magnesium alloy S. O. KIM1, J. S. KWAK2 1. Graduate School of Mechanical Engineering... to be machined plays a significantly important role in magnetic abrasive polishing process. But in a case of polishing nonferrous materials, the strength of magnetic force is very low and it leads......
; 文献标志码:A 根据国际半导体技术发展路线图(International technology roadmap for semiconductors, ITRS)2014版的预测,超大规模集成电路还将延续Moore定律迅速发展.伴随集成度的提高,特征尺寸的减小以及各种新材料,新工艺的不断涌现,对化学机械抛光/平坦化(Chemical mechanical polishing...-chun. Chemical mechanical polishing: theory and experiment[J]. Friction, 2013, 1(4): 306-326. [3] DUBOIS C, SYLVESTRE A, CHAABOUNI H, FARCY A. Impact of the CMP process on the electrical properties......
, 2009, 209(20): 6140-6145. [2] SONG Xiao-lan, XU Da-yu, ZHANG Xiao-wei, SHI Xun-da, JIANG Nan, QIU Guan-zhou. Electrochemical behavior and polishing properties of silicon wafer in alkaline slurry... abrasive particles during oxide CMP: A defectivity study[J]. Journal of the Electrochemical Society, 2008, 155(9): 653-660. [5] HOSHINO T, KURATA Y, TERASAKI Y, SUSA K. Mechanism of polishing......
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of the Electrochemical Society, 2007, 154(8): 667-671. [3] ARMINI S, WHELAN C M, MOINPOUR M, MAEX K. Composite polymer core-silica shell abrasives: The effect of polishing time and slurry solid content on oxide CMP[J... 文献标志码:A Preparation and polishing performance of polystyrene-ceria and polystyrene-silica composite with novel core-shell structure CHEN Yang1, LONG Ren-wei1, CHEN Zhi-gang2......
Recovery of cerium from glass polishing slurryJong-Young Kim1,Ung-Soo Kim1,Myeong-Seop Byeon1,Woo-Kyu Kang2,Kwang-Teak Hwang1,Woo-Seok Cho1摘 要:Cerium was extracted from rare earth slurry waste used for polishing a glass substrate.Initially,glass frit and flocculant were removed by froth flotation and dissolution.The recovered rare earth slurry exhibited......
Recovery of cerium from glass polishing slurryJong-Young Kim1,Ung-Soo Kim1,Myeong-Seop Byeon1,Woo-Kyu Kang2,Kwang-Teak Hwang1,Woo-Seok Cho1摘 要:Cerium was extracted from rare earth slurry waste used for polishing a glass substrate.Initially,glass frit and flocculant were removed by froth flotation and dissolution.The recovered rare earth slurry exhibited......
Electrochemical process of titanium extraction CH. RVS. NAGESH, C. S. RAMACHANDRAN Defence Metallurgical Research Laboratory, Hyderabad, A.P. India-500058 Received 20 November 2005; accepted 9...; Abstract: A wide variety of processes are being pursued by researchers for cost effective extraction of titanium metal. Electrochemical processes are promising due to simplicity and being less capital......
water-free slurry applying for CLBO crystal chemical mechanical polishing(CMP) was investigated. The abrasive is SiO2. The influence of polishing processing parameter on polishing process for CLBO crystal was discussed, and the parameter optimal value of polishing plate speed, pressure, pH value and abrasive concentration were determined. Through such parameters, high efficiency and precision......
(School of Mechanical and Electrical Engineering, Central South University, Changsha 410083, China) Abstract: With the float-pieces polisher, the effect of the stability of polishing slurries and the nanodiamond particle size on the surface quality of magnetic head was studied. The relationship between polishing procedure and the surface quality was analyzed. The surface quality of magnetic......