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铝化学机械抛光中1,2,4-三唑和苯并三氮唑的缓蚀机制刘萍,王永光,赵永武,朱玉广摘 要:揭示铝低压力化学机械抛光(CMP)中的弱缓蚀机制是铝CMP研究的关键问题.采用CMP试验,研究了1,2,4-三唑(TAZ)和苯并三氮唑(BTA)对铝表面去除率的影响规律;通过接触角和表面原子力显微镜(AFM)试验,分析了TAZ和BTA薄膜在铝表面的亲水性能,发现由TAZ作用形成的缓蚀薄膜比由BTA形成的缓蚀薄膜更厚,更易渗透与去除.结合摩擦磨损试验和Arrhenius公式,探讨了TAZ和BTA在CMP过程中对铝表面化学反应活化能的影响.结果显示:TAZ的活化能小于BTA,更容易形成弱缓蚀薄膜,机械促进化学作用的效果更明显.关键词:低压力;化学机械抛光;1,2,4-三唑;摩擦磨损;化学反应活化能;......
of the Electrochemical Society, 2007, 154(8): 667-671. [3] ARMINI S, WHELAN C M, MOINPOUR M, MAEX K. Composite polymer core-silica shell abrasives: The effect of polishing time and slurry solid content on oxide CMP[J... analysis (TGA). The thermal oxide film covered silicon wafer was chemical mechanical polished (CMP) by composite abrasives, and the polishing behavior of the novel composite abrasives was characterized......
and systems of tape casting were outlined. Constituents of slurry were analyzed and each composition was clearly presented. The principles and processes of tape casting were discussed. Novel tape casting... casting; slurry; molding; additive; research progress 高性能陶瓷材料具有高强度,高硬度,耐磨损和耐腐蚀等特点,广泛应用于能源,信息,航空航天,电子,生物和医学等领域[1].陶瓷成型方法是决定陶瓷性能的一个重要因素,因此是研究的热点.为了解决薄板材的成型问题,HOWATTG[2]于1947年提出了一种简单而有效的陶瓷成型工艺--流延成型(Tape......
组合式金刚石修整器修整应用研究尹翔1,2,刘伟1,2,苗苗1,21. 安泰科技股份有限公司2. 北京安泰钢研超硬材料制品有限责任公司摘 要:金刚石修整器是半导体制程中修整CMP抛光垫不可缺少的工具,半导体集成电路堆叠越来越密集,特征线宽越缩越小,新制程技术已迈入了7纳米制程,传统的金刚石修整器已不足以应付新工艺技术的需求.组合式金刚石修整器搭配特殊的钎焊技术及组合调整方法,有效地为CMP制程提供了解决方案,透过大的不锈钢基座,搭配具有通孔的小研磨盘,可灵活运用于各阶段的化学机械抛光制程,以达到提升CMP整体制程效能,符合更小线宽的制程技术需求.关键词:金刚石修整器;化学机械抛光;钎焊技术;......
; 神经网络; 机理模型; 预测模型; 灰色理论 中图分类号: TF335.2; TF821 文献标识码: A Raw mix slurry quality prediction model used for alumina sintering production process LI Jie1, KONG Ling-shuang2, YANG Chun-hua2 (1. School...) Abstract: Based on the analysis of the characteristics of the raw mix slurry preparing process in alumina sintering production process, firstly, a mechanism model based on material balance principle......
的铸件的微观组织呈现等轴球晶形貌,610℃时淬火试样的初生相晶粒平均直径为29 ?m,同时在缓慢冷却程中初生相α(Al)晶粒趋向于圆整并粗化. 关键词:半固态浆料；微观组织；热焓平衡；旋转磁场 中图分类号:TG 146.2; TG 249 文献标志码:A Semisolid slurry produced using enthalpy... of Technology, Dalian 116024, China; 4. Beijing General Research Institute for Non-ferrous Metals, Beijing 100088, China) Abstract: The semisolid slurry of A356 aluminum alloy was prepared using an enthalpy......
分类号:TD853 文献标志码:A Pipeline transportation characteristics of filling paste-like slurry pipeline in deep mine ZHANG Qi-li, LIU Qi, ZHAO Jian-wen, LIU Jian-gang (School of Resources and Safety Engineering, Central South University, Changsha 410083, China) Abstract: Based on the engineering example of the filling slurry pipeline system in a deep metal mine, the dynamic......
单晶硅片化学机械抛光材料去除特性杜家熙,苏建修,万秀颖,宁欣摘 要:根据化学机械抛光(CMP)过程中硅片表面材料的磨损行为,建立了硅片CMP时的材料去除率模型,设计了不同成分的抛光液并进行了材料去除率实验,得出了机械,化学及其交互作用所引起的材料去除率.结果表明,磨粒的机械作用是化学机械抛光中的主要机械作用,磨粒的机械作用与抛光液的化学作用交互引起的材料去除率是主要的材料去除率.关键词:硅片;化学机械抛光;材料去除机理;材料去除率;磨损行为;......
for fabrication and rheoformation of aluminum and magnesium alloys semisolid slurry TENG Hai-tao1, 2, XIONG Bai-qing1, ZHANG Yong-an1, LI Ting-ju2, ZHANG Xiao-li2, XIE Shui-sheng1 (1. State Key Laboratory... semisolid slurry of A356 aluminum alloy in different pouring temperatures, were introduced. The results show that the microstructures are directly related to the pouring temperature, the lower pouring......
, 31(6): 1672-1685. DOI: 10.11817/j.ysxb.1004.0609.2021-39742 FU Zi-guo, LI Hua, DENG Jian-hui, et al. Bivariate rheological model of ultrafine tailings backfill slurry based on structural parameter...料浆的结构参数在一定范围内是剪切强度的函数. 由以上结论及分析可知,料浆流变参数不仅受物料性质,质量浓度和水泥添加量的影响,同时还受到剪切强度及时间的影响.这给料浆流变参数的测定带来了困难. 图8 模型对不同配比料浆流变数据的拟合曲线 Fig. 8 Fitting curves of proposed model on rheological data of slurry......
