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Chemical Structure of Carbon Nitride Films Prepared by MW-ECR Plasma Enhanced Magnetron Sputtering XU Jun1,LI Xin1,DONG Chuang1,DENG Xin-lu1,GAO Peng1,DING Wan-yu1 (1.State Key Lab. for Materials...-enhanced DC magnetron sputtering using twinned microwave electron cyclotron resonance plasma sources. Chemical structure of deposited films was investigated using X-ray photoelectron spectroscopy and Fourier......
. Ltd.,Beijing 100083,China) Abstract:Cu films with thickness of about 500nm were deposited on glass substrates without heat-ing by DC magnetron sputtering in pure Ar gas of 1.0Pa. The sputtering... magnetron sputtering; sputtering power; structure; resistivity; [全文内容正在添加中] ......
Influence of oxygen partial pressure on properties of N-doped ZnO films deposited by magnetron sputtering WANG Jin-zhong(王金忠)1, 2, E. ElANGOVAN2, N. FRANCO3, A. ALVESE3, A. REGO4, R...) are highly resistive (> 105 W?cm) Key words: ZnO; oxygen partial pressure; magnetron sputtering; transmittance 1 Introduction Zinc oxide (ZnO) is a promising candidate for UV or blue light......
STUDY ON Ni-Cr SYSTEM SOLAR SELECTIVE THIN FILMS PREPARED BY MAGNETRON REACTIVE SPUTTERING PROCESS H.Shen1,B.W.Wang1 (1.Guangzhou Institute of Energy Conversion,The Chinese Academy of Sciences,Guangzhou 510070,China) Abstract:Ni-Cr System solar selective thin solid films were prepared by d.c. magnetron reactivesputtering under the atmosphere of O2 and N2. Ni-Cr alloy was chosen......
Photocatalytic degradation characteristic of amorphous TiO2-W thin films deposited by magnetron sputtering HUANG Jia-mu(黄佳木), LI Yue-xia(李月霞), ZHAO Guo-dong(赵国栋), CAI Xiao-ping(蔡小平) College... magnetron sputtering. Properties of the films were analyzed via AFM, XRD, XPS, STS, UV-Vis and ellipse polarization apparatus. The results show that TiO2-W films are amorphous. The AFM map reveals......
OPTICAL CHARACTERIZATION OF TiO2 THIN FILM ON SILICON SUBSTRATE DEPOSITED BY DC REACTIVE MAGNETRON SPUTTERING D.Chen1,B.W.Wang2,H.Shen3,H.Q. Wang4,D.C. Ba5,L.S.Wen6 (1.Material and Science... reactive magnetron sputtering process from Ti target. The reflectivity of the films was measured by UV-3101PC, and the index of refraction (n) and extinction coefficient (k) were measured by n & k......
MICROSTRUCTURE AND PROPERTIES OF ANNEALED ZnO THIN FILMS DEPOSITED BY MAGNETRON SPUTTERING A. Asadov1,M. Hodgson1,J.LEE2,W.Gao1,J. Metson3,Z.Li1 (1.Department of Chemical and Materials Engineering... of Auckland, Private Bag 92019, Auckland 1004, New Zealand) Abstract:ZnO thin films were deposited on a glass substrate by dc (direct current) and rf (radio frequency) magnetron sputtering. Post-deposition......
Article ID: 1003-6326(2005)06-1214-05 Growth characteristics of MoS2 coatings prepared by unbalanced bipolar DC magnetron sputtering WANG Ji-hui(王吉会)1, XIA Yang(夏 扬)1, E.Wieers2..., Belgium; 3. Department of MTM, Katholieke Universiteit Leuven, B-3001 Leuven, Belgium) Abstract: MoS2 coatings were prepared by unbalanced bipolar DC magnetron sputtering under different argon pressures......
Phase control of magnetron sputtering deposited Gd2O3 thin films as high-κ gate dielectrics YANG Zhimin1,YUE Shoujing1,WEI Feng1,WANG Yi1,DU Jun1,TU Hailing1 (1.Advanced Electronic Materials... an increase in JL by nearly one order of magnitude and a reduction of effective dielectric constant from 17 to 9. Key words:Gd2O3 thin film; rare earth oxide; high-κ gate dielectric; magnetron sputtering......
J. Cent. South Univ. Technol. (2009) 16: 0719-0724 DOI: 10.1007/s11771-009-0119-y Composition design and properties of CoNbZr amorphous films deposited by unbalanced magnetron sputtering GUO...; Abstract: Co87Nb10Zr3, Co76Nb19Zr5, Co64Nb26Zr10 and Co64Nb16Zr20 amorphous films were deposited on noncrystalline glass substrates by DC unbalanced magnetron sputtering. The compositions......
