共搜索到1674条信息，每页显示10条信息，共168页。用时：0小时0分0秒608毫秒
；惩罚函数 中图分类号:TP301 文献标志码:A 文章编号:1672-7207(2011)S1-0165-04 Optimal control of raw slurry blending...: During the sintering production of the alumina, several kinds of the raw materials are blended to produce the raw slurry. The raw slurry is stored in the raw slurry tanks. In the blending tank process......
编号:1672-7207(2018)10-2561-07 Study on hydrodynamic pressure of paste slurry based on fluid dynamics ZHANG Aiqing1, WU Aixiang1, WANG Yiming1, WANG Hongjiang1,YIN Shenghua1, WANG Zhengying2 (1. School... and the research achievements of debris flow impact, paste slurry formula of hydrodynamic pressure was established. Using a room of paste filling mining as an engineering example, the monitoring test......
of China, Xi’an 710054, China) Abstract: Aiming at the two different discharge outlets, the flow deposition law and the particle distribution of the slurry were analyzed, and the spatial distribution of the backfill strength was studied by the slurry filling similar model test. With the consideration of the characteristics of strength distribution in goaf, the strength evaluation method of backfill......
, the smaller the average surface roughness value Ra. The depth of nick is affected more obviously by the stability of the slurry than by the particle size in the slurry. The deep nick can be erased.... Key words: nanodiamond; slurry; magnetic head; polishing 随着微电子技术的发展,硬盘的容量越来越大,且发展非常迅速,目前,其存储容量正逐步向1000G发展[1].硬盘尺寸越来越小,可以广泛用于手机,数码相机和MP3等.为满足更高需求,磁头的工作方式由接触起停方式向载入载出方式转变,同时磁头在硬盘表面的飞行高度......
金属学报, 2015, 25(11): 3190-3195.ZHANG Qi-li, LIU Qi, ZHAO Jian-wen, LIU Jian-gang. Pipeline transportation characteristics of filling paste-like slurry pipeline in deep mine[J]. The Chinese Journal... filling slurry in three-phase flow[J]. The Chinese Journal of Nonferrous Metals, 2015, 25(4): 1049-1055. [6] 焦华喆, 吴爱祥, 王洪江, 刘晓辉, 杨盛凯, 肖云涛. 全尾砂絮凝沉降特性实验研究 [J]. 北京科技大学学报, 2011, 33(12): 1437-1441.JIAO Hua-zhe......
化学机械抛光的理论模型研究综述黄传锦,周海,陈西府盐城工学院机械工程学院摘 要:化学机械抛光(Chemical Mechanical Polishing,CMP)是当今唯一能够提供全局平面化的技术,其抛光机理的研究是当前的热点.综述了考虑抛光液和抛光垫特性的抛光机理模型,分析了各模型的相关特点,最后对CMP模型的发展和研究方向提出展望.关键词:化学机械抛光;平坦化;抛光率;抛光垫;......
硬脆材料的化学机械抛光机理研究武昌壕,郭冰,姚光,赵清亮哈尔滨工业大学机电工程学院摘 要:化学机械抛光(Chemical Mechanical Polishing,简称CMP)技术是目前唯一可提供全局平面化的超精密表面加工技术,加工后无表面和亚表面损伤.该技术广泛应用于光学元件,微机电系统,集成电路芯片等表面的处理,可达到纳米级的表面粗糙度和微米级的面形精度.目前的研究主要集中在化学机械抛光工艺上,抛光机理尚未形成统一的学说.针对硬脆材料(Si,SiC)的CMP技术进行综述,介绍了CMP技术的发展现状,并对加工过程中存在的材料去除机理做了可能性解释,最后对CMP技术的发展和研究重点做了预测和建议.关键词:化学机械抛光;去除机理;影响因素;表面质量;......
, QIAO Deng-pan, WANG Jun, et al. Numerical simulation and new model of pipeline transportation resistance of waste rock-aeolian sand high concentration slurry[J]. The Chinese Journal of Nonferrous... cloud of scheme 3 表4 水泥添加量为310 kg/m3,料浆浓度为82%时不同流速下的沿程阻力损失 Table 4 Resistance loss along way under slurry concentration of 82% and cement of 310 kg/m3 at different velocities 图4 料浆......
......
; 文献标志码:A 文章编号:1672-7207(2015)08-3138-07 Factors influencing dynamics evolution of ice crystals during ice slurry storage XU Aixiang1... and its evolution during the process of ice slurry storage, the population balance model (PBM) was developed to make a numerical simulation on the ice crystal size distribution and their evolution......
