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的增加呈逐渐变小的趋势.氧化膜结构大致分为3层,最外层颜色较深.1.5Ta和2Ta合金的氧化膜较致密,厚度较小.2Ta合金中氧化膜出现了与基体开裂的现象. 图3 含钽Co-8.8Al-9.8W-xTa合金氧化膜的相组成 Fig. 3 XRD patterns of oxide film of Co-8.8Al-9.8W-xTa superalloys 图4 Co-8.8Al-9.8W-xTa合金氧化膜截面和表面的显微组织 Fig. 4 Cross-sectional and surface microstructures of oxide film of Co-8.8Al-9.8W-xTa superalloys 图5所示为0.5Ta和1.5Ta合金氧化膜的元素分布.由图5可以看出,合金氧化膜大致分为3层,即厚度随Ta含量增加逐渐减小的钴......
of scanning electron microscope(SEM)and high voltage electron microscope(HVEM)we have observedand analysed morphology and micro-structure of silicon oxide film with different thickness formed on(111... simulaneously forming silicon oxide film.关键词:......
Photoluminescence and Electroluminescence Studies on Tb-Doped Silicon Rich Oxide Materials and Devices Wei Gao1,Yoshi Ono1,Sheng-Teng Hsu1,Ting-kai Li1 (1.Sharp Labs of America, 5750 N.W. Pacific Rim Blvd., Camas, Washington, 98607, USA) Abstract:Photoluminescence (PL) characteristics of Tb-doped silicon rich oxide (SRO) films prepared by DC-sputtering and post-annealing processes were studied......
钛合金阳极氧化膜的XPS研究 朱胜利1,杜志惠2,杨贤金1,崔振铎1 (1.天津大学材料科学与工程学院,天津,300072;2.航天材料及工艺研究所,北京,100076) 摘要:利用XPS分析了TCA钛合金经阳极氧化处理后,表面氧化膜的成分和结构及其随深度的变化.研究表明,钛合金阳极氧化膜表面为单一的TiO_2,并以晶态和非晶态的形式存在于氧化膜中.随着氧化膜厚度的增加,内部氧化越来越不充分,TiO_2的含量减少,并逐渐出现Ti:O_3,TiO;并且阳极氧化处理明显增厚了表面氧化膜. 关键词:钛合金; 阳极氧化; XPS; Titanium alloy; Anodic oxide film; XPS; [全文内容正在添加中] ......
band maxi-mum. This shift depended on the oxide layer thickness and interfacial structure. An interfacial layer was observed at the initial growth of Er2O3 film on Si, which was supposed...In situ photoemission study of interface and film formation during epitaxial growth of Er2O3 film on Si(001) substrate朱燕艳1,方泽波2,廖灿2,陈圣21. Department of Mathematics and Physics, Shanghai University......
of metal zinc film[11], pulse laser deposition (PLD)[12]. Pulse laser deposition (PLD) technique is more useful in obtaining high quality thin films of metal oxide materials compared with other... is attributed to the existence of antisite defects (OZn). The intensity of UV and deep level light depends strongly on the surface morphology and is explained by the surface roughness of ZnO film......
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核电高温高压水中不锈钢和镍基合金的腐蚀机制韩恩厚1,2,王俭秋1,吴欣强2,柯伟2(1.辽宁省沈阳市科学院金属研究所金属腐蚀与防护国家重点实验室2.辽宁省沈阳市科学院金属研究所辽宁省核电材料安全与评价技术重点实验室)摘 要:综述了近年来在核电高温高压水中不锈钢和镍基合金的腐蚀电化学行为规律,以及材料表面膜的成分,组织结构和电子特征.通过系统分析水介质化学和材料微观结构对表面膜的影响,试图把膜的特性与腐蚀电化学行为联系起来.讨论了核电高温高压水中材料的腐蚀机制,提出核电高温高压水中不锈钢和镍基合金的腐蚀机制与常温......
类号:O 484 文献标识码:A Effects of sputtering pressure on electrical and optical properties of transparent conducting ZnO thin film ZHOU Ji-cheng, LI Li (School.... The experimental results indicate that the crystalline quality of ZnO thin film is improved and the thin film shows higher c-axis orientation with increasing the pressure. The average transparency of ZnO......
effects of a frictionally generated oxide film covering the friction surface of Ti3SiC2, and a balance between the generating rate and the removing (wearing) rate of the film. Key words: Ti3SiC2; tribological behavior; oxide film; antifriction effect; sliding speed; normal pressure CLC number: TB332 Document code: A <上一页 1 2 3 4 5 6 7 8 9 10... 1028 下一页 >