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at the bias voltage of -100 V. Key words: graphite-like carbon; high power impulse magnetron sputtering; substrate bias; microstructure; tribological behavior 1 Introduction Carbon is one of the most... rectangular C target (99.99%). Prior to deposition, the substrates were cleaned with Ar plasma sputtering at a bias voltage of 500 V for 20 min so as to remove the native oxide on the substrates. The base......
THE EFFECTS OF PULSE BIAS VOLTAGE AND N2 PARTIAL PRESSURE ON TiAIN FILMS OF ARC ION PLATING (AIP) C.Sun1,M.S.Li1,S.L.Zhu1,L.S.Wen1,Fuhui WANG1 (1.Institute of Metal Research, The Chinese Academy... for compressor blade of areo-engine under different d.c pulse bias voltage and ni-trogen partial pressure. The effects of substrate pulse bias and nitrogen partial pressureon the deposition rate, droplet......
Characterization of (100)-orientated diamond film grown by HFCVD method with a positive DC bias voltage MA Ying(马 莹)1, WANG Lin-jun(王林军)1, LIU Jian-min(刘建敏)1, SU Qing-feng(苏青峰)1, XU Run(徐... (HFCVD) technology with a positive DC bias voltage. The morphology, X-ray diffraction (XRD), RAMAN spectrum and dark current versus applied voltage characteristics analysis show that the positive dc bias......
of the buffer, and the IIP3 performance largely depends on the value of the resistor-turning network and the DC bias voltage of the RF stage and LO stage. For 2.4-GHz ISM band applications... is the transconductance of NMOS. In this design, the bias voltage and aspect ratio of transistors are selected to guarantee << 1  ......
Influence of Negative Bias Voltage on the Mechanical and Tribological Properties of MoS2/Zr Composite Films宋文龙Shantui Construction Machinery Co.,LtdDepartment of Mechanical Engineering,Shandong...-arc ion plated techniques.The influence of negative bias voltage on the composite film properties,including adhesion strength,micro-hardness,thickness and tribological properties were......
voltage was less than -100 V; however, the AIP process was accompanied with the re-sputtering phenomenon at higher substrate bias voltages [19]. Such a change in the deposition rate may be related to two simultaneous effects brought by substrate bias voltage. One is the accelerating deposition effect resulting from the increase of the ion quantity and velocity; the other is the re-sputtering effect......
, pure Ti films were prepared by magnetron sputtering at the bias voltage of 0-140 V. The microstructure of Ti films was characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM... orientation of Ti films was discussed. Key words: Ti film; magnetron sputtering; bias voltage; nanocrystalline; Hall-Petch relationship 1 Introduction Nowadays, Ti films are widely used in aerospace......
Magnetoelectric voltage coefficients of magnetoelectric composites WAN Yong-ping (万永平), ZHONG Zheng (仲 政)1, QIU Jin-hao(裘进浩)2 1.School of Aerospace Engineering and Applied...: The magnetoelectric(ME) effect of the particulate magnetostrictive/piezoelectric composite was theoretically studied. The dependence of the ME voltage coefficients on the material properties of the magnetostrictive......
magnetron sputtering(HIPIMS)technique at room temperature.The effects of substrate negative bias voltage on the deposition rate,composition,crystal structure,surface morphology,microstructure and mechanical properties were investigated.The results revealed that with the increase in bias voltage from-50 to-400 V,TiN coatings exhibited a trend of densification and the crystal structure gradually evolved......
to prepare Cr coating on AZ31 magnesium alloy and the influence of bias voltage on properties of Cr coating was investigated. The obtained coatings present an (110) preferred texture and have a developed columnar structure. With increasing bias voltage, the surface structure of Cr coating becomes denser. All of the Cr-coated AZ31 have much higher surface microhardness than bare AZ31. The Cr coating......