共搜索到11886条信息,每页显示10条信息,共1189页。用时:0小时0分0秒568毫秒
Structure and visible photocatalytic activity of nitrogen-doped meso-porous TiO2 layer on Ti6Al4V substrate by plasma-based ion implantation LI Jin-long(李金龙)1, 2, 3, MA Xin-xin(马欣新)1, SUN Ming-ren...: The nitrogen-doped porous TiO2 layer on Ti6Al4V substrate was fabricated by plasma-based ion implantation of He, O and N. In order to increase the photodegradation efficiency of TiO2 layer, two methods......
......
......
Properties of Ultra-Thin Hafnium Oxide and Interfacial Layer Deposited by Atomic Layer Deposition Young-Bae Kim1,Taeho Lee2,Jinho Ahn2,Duck-Kyun Choi1,Kyung-Il Hong1 (1.Department of Ceramic...) Abstract:Ultra-thin hafnium-oxide gate dielectric films deposited by atomic layer deposition technique using HfCl4 and H2O precursor on a hydrogen-terminated Si substrate were investigated. X-ray......
Film Layer Structure and Wear Resistance on High Strength Room Temperature Blackening of Cu-Se-P System ZHANG Yu-feng1,WANG Jian-cheng1,ZHOU Hou-qiang1 (1.Wuhan Ordnance Noncommissioned Officer...; blackening; film layer structure; wear resistance; [全文内容正在添加中] ......
Ultrasonic Degradation of Methyl Orange in Presence of Y2O3 Doping Anatase TiO2 Catalyst Guo Baodong1,PAN Zhijun1,Wen Fuyu1,LIU Zhenrong1,ZHANG Zhaohong1,Wang Jun1 (1.Department of Chemistry, Liaoning University, Shenyang, 110036 China) Abstract:Various affecting factors and degradation mechanism were studied on ultrasonic degradation of methyl orange adopting Y2O3 doping anatase TiO2 catalyst......
Effect of TiO2 Seed Layer on 0.7Pb(Mg0.33Nb0.67)O3-0.3PbTiO3 Thin Films Deposited by Radio Frequency Magnetron Sputtering王俊明,费维栋School of Materials Science & Engineering,Harbin Institute.../Ti/SiO2/Si substrates.The phase compositions and microstructure of thin films were characterized by X-ray diffraction(XRD) and scanning electric microstructure(SEM).The effect of the TiO2 seed layer on PMN......
OPTICAL CHARACTERIZATION OF TiO2 THIN FILM ON SILICON SUBSTRATE DEPOSITED BY DC REACTIVE MAGNETRON SPUTTERING D.Chen1,B.W.Wang2,H.Shen3,H.Q. Wang4,D.C. Ba5,L.S.Wen6 (1.Material and Science..., Shenyang 110004, China;6.Institute of Metal Research, The Chinese Academy of Sciences, Shenyang 110016, China) Abstract:TiO2 thin film has attracted considerable attention in recent years, due to its......
Numerical analysis of behavior of active layer in rotary kilns by discrete element methodXIE Zhi-yin(谢知音)1, FENG Jun-xiao(冯俊小)2(1. School of Mechanical Engineering, University of Science and Technology Beijing, Beijing 100083, China; 2. Beijing Key Laboratory for Energy Saving and Emission Reduction of Metallurgical Industry, Beijing 100083, China)Abstract:The behavior of the active layer......
......