Surface Passivation of Nanocrystalline Silicon Powder Derived from Cryomilling
来源期刊：Journal Of Wuhan University Of Technology Materials Science Edition2014年第1期
论文作者：王志浩 HUANG Zhifeng 陈斐 SHEN Qiang ZHANG Lianmeng
文章页码：65 - 69
摘 要：The surface passivation mechanism of nanocrystalline silicon powder was studied. The liquid nitrogen/argon was used as the medium to prepare the nanocrystalline silicon powder, using a cryomilling technology. The X-ray diffraction, transmission electron microscopy, plasma emission spectroscopy and infrared spectrum were used to analyze the prepared samples, and density functional theory was used to investigate the cryomilling process. For nanocrystalline silicon powder cryomilled with liquid N2, the amorphous outer layer with N element is formed on the surface, and chemisorption caused by the formation of Si-N-Si bond leads to the surface passivation, although physisorption also be confirmed, the Si-N bond is steady after exploded in air for 30 days and no new bond is observed. For nanocrystalline silicon powder cryomilled with liquid Ar, no new chemical bond is observed, Ar element absorbs on the surface of the prepared powder only through physisorption, and after exploded in air for 30 days, a Si-O bond can be observed obviously.
王志浩1，HUANG Zhifeng1，陈斐1,2，SHEN Qiang1，ZHANG Lianmeng1,2
1. State Key Lab of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology2. Key Laboratory of Advanced Technology for Specially Functional Materials, Ministry of Education, Wuhan University of Technology
摘 要：The surface passivation mechanism of nanocrystalline silicon powder was studied. The liquid nitrogen/argon was used as the medium to prepare the nanocrystalline silicon powder, using a cryomilling technology. The X-ray diffraction, transmission electron microscopy, plasma emission spectroscopy and infrared spectrum were used to analyze the prepared samples, and density functional theory was used to investigate the cryomilling process. For nanocrystalline silicon powder cryomilled with liquid N2, the amorphous outer layer with N element is formed on the surface, and chemisorption caused by the formation of Si-N-Si bond leads to the surface passivation, although physisorption also be confirmed, the Si-N bond is steady after exploded in air for 30 days and no new bond is observed. For nanocrystalline silicon powder cryomilled with liquid Ar, no new chemical bond is observed, Ar element absorbs on the surface of the prepared powder only through physisorption, and after exploded in air for 30 days, a Si-O bond can be observed obviously.
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