Tribological behavior and wear mechanism of resin-matrix contact strip against copper with electrical current

来源期刊:中国有色金属学报(英文版)2008年第5期

论文作者:涂川俊 陈振华 陈鼎 严红革 何凤亿

文章页码:1157 - 1163

Key words:electric contact friction and wear; RMPCS; wear mechanism; arc erosion

Abstract: The resin-matrix pantograph contact strip (RMPCS), which has excellent abrasion resistance with electrical current and friction-reducing function, was developed in view of the traditional contact strips with high maintenance cost, high wear rate with electrical current and severe damage to the copper conducting wire. The characteristics of worn surfaces, cross-section and typical elemental distributions of RMPCS were studied by scanning electron microscopy (SEM) and energy dispersion spectrometry (EDS). The wear behavior and arc discharge of RMPCS against copper were investigated with self-made electrical wear tester. The results show that the electrical current plays a critical role in determining the wear behavior, and the wear rate of the RMPCS against copper with electrical current is 2.7-5.8 times higher than the value without electrical current. The wear rate of the contact strip increases with the increase of the sliding speed and electrical current density. The main wear mechanism of RMPCS against copper without electrical current is low stress grain abrasive and slightly adhesive wear, while arc erosion wear and oxidation wear are the dominate mechanism with electrical current, which is accompanied by adhesive wear during the process of wear.

基金信息:the Key Laboratory Open Foundation of Hunan Province, China

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