Anomalous formation of micrometer-thick amorphous oxide surficial layers during high-temperature oxidation of ZrAl2
来源期刊：JOURNAL OF MATERIALS SCIENCE TECHNOLOG2019年第7期
论文作者：Zhangping Hu Yifei Xu Yuanyuan Chen Peter Schützendübe Jiangyong Wang Yuan Huang Yongchang Liu Zumin Wang
文章页码：1479 - 1484
摘 要：The thermal oxidation of ZrAl2 in the temperature range of 550–750℃ in pure oxygen has been investigated by a combinational experimental approach using X-ray diffraction, scanning electron microscopy/energy dispersive spectrometer, Auger electron spectroscopy and cross-sectional transmission electron microscopy. The thermal oxidation leads to the growth of anomalously thick（up to 4.5 μm）amorphous(Zr0.33 Al0.67)O1.66 surficial layers at temperatures as high as 750℃. The oxidation kinetics obeys a parabolic law with an activation energy of 143 kJ/mol. The underlying mechanism for the formation of such micrometer-thick amorphous oxide surficial layers has been discussed on the basis of interface thermodynamics and the occurrence of high interface stability associated with a synchronous oxidation of Al and Zr elements.
Zhangping Hu，Yifei Xu，Yuanyuan Chen，Peter Schützendübe，Jiangyong Wang，Yuan Huang，Yongchang Liu，Zumin Wang
School of Materials Science and Engineering, Tianjin UniversityMax Planck Institute for Intelligent SystemsDepartment of Physics, Shantou University
摘 要：The thermal oxidation of ZrAl2 in the temperature range of 550–750℃ in pure oxygen has been investigated by a combinational experimental approach using X-ray diffraction, scanning electron microscopy/energy dispersive spectrometer, Auger electron spectroscopy and cross-sectional transmission electron microscopy. The thermal oxidation leads to the growth of anomalously thick（up to 4.5 μm）amorphous(Zr0.33 Al0.67)O1.66 surficial layers at temperatures as high as 750℃. The oxidation kinetics obeys a parabolic law with an activation energy of 143 kJ/mol. The underlying mechanism for the formation of such micrometer-thick amorphous oxide surficial layers has been discussed on the basis of interface thermodynamics and the occurrence of high interface stability associated with a synchronous oxidation of Al and Zr elements.
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