磁控溅射Al-Mg-B薄膜成分优化

来源期刊：金属学报2011年第5期

论文作者：曲文超 吴爱民 吴占玲 白亦真 姜辛

文章页码：628 - 633

关键词：磁控溅射； Al-Mg-B薄膜； 硬度； B₁₂二十面体

Key words：magnetron sputtering； Al-Mg-B film； hardness； B₁₂ icosahedra structure

摘    要：采用多靶磁控共溅射技术,利用高纯度Al,Mg和B单质靶材为溅射源,室温下在单晶Si(100)表面上成功制备了低摩擦系数的非晶态Al-Mg-B硬质薄膜.通过改变Al/Mg混合靶体积配比及靶材溅射功率来调控薄膜成分,最终制备的Al-Mg-B薄膜成分接近AlMgB₁₄相的元素成分比,其Vickers硬度约为32 GPa.XRD及HR-TEM分析表明.制备的薄膜均为非晶态XPS测试表明薄膜内部存在B-B及Al-B单键;FTIR进一步测试表明,在波数1100 cm^-1处出现较为明显的振动吸收峰,证明制备的薄膜中含有B₁₂二十面体结构,这也是薄膜具有超硬性的主要原因.薄膜摩擦磨损测试表明薄膜摩擦系数在0.07左右.

Abstract: Aluminum magnesium boron ternary boride (AlMgB₁₄) possesses high hardness, high-temperature oxidation resistance,high temperature corrosion resistance,low density,low friction and other excellent properties,and could be widely used in tool,mold,micro-mechanical manufacture and aerospace,et al.In this paper,Al-Mg-B films have been prepared by multitarget (high pure aluminum,magnesium and boron targets)magnetron sputtering on the silicon (100) substrate at room temperature.The films with an atomic ratio of Al:Mg:B= 1:1:14 were obtained by controlling the sputtering power and the volume ratio of Al/Mg co-target.X-ray diffraction (XRD) and High resolution transmission electron microscopy (HR-TEM) test results show that all the as-deposited films are amorphous. The X-ray photoelectron spectroscopy (XPS) results showe that there are some B-B and Al-B single bond in the as-deposited films,and the Fourier transform infrared spectroscopy (FTIR) tests indicate further that the films possess B₁₂icosahedra structure. The hardness of the films as shown by nano indentor test will be increasing with the increase of content of B around B-AlMg isoelectronic line and close to boron-rich side,and up to 32 GPa with low friction coefficients of 0.06-0.08.