苯并三氮唑与4-羧基苯并三氮唑在氯化钠溶液中对铜的缓蚀作用

来源期刊:中国有色金属学报2001年第1期

论文作者:徐群杰 周国定 陆柱 刘峰名 田中群 林昌健

文章页码:135 - 139

关键词:铜电极; 苯并三氮唑; 缓蚀剂; 表面增强拉曼光谱

Key words:Cu electrode; BTA; inhibitor; SERS

摘    要:用表面增强拉曼光谱技术(SERS)对在3%NaCl溶液中苯并三氮唑(BTA)及其衍生物4-羧基苯并三氮唑(4CBTA)对铜的缓蚀作用机理进行了研究。发现4CBTA对铜的缓蚀作用机理与BTA相似,在较正电位下两者都是通过三唑环与铜形成配合物覆盖在铜表面;随着电位负移,铜电极表面吸附的分子形式的BTA或4CBTA数量增多; 4CBTA中的COOH基团只是起到空间位阻的作用,没有参与电极表面的吸附。两者复配使用时以BTA吸附为主,其缓蚀机理没有发生改变,也没有产生协同效应。

Abstract: The corrosion inhibition of BTA and its derivative 4CBTA on Cu electrode in 3% NaCl solution was studied by SERS technique. The inhibition mechanism for these inhibitors was found to be nearly the same, which form a protective film through the triazole ring. As the potential turns negative, the molecules of BTA or 4CBTA gradually adsorbs on the copper surface. The substitute group(-COOH) of 4CBTA acts as a steric hindrance. A combination of BTA and 4CBTA doesn't show any synergistic effect and the adsorption substance on the copper surface is mainly BTA.

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