简介概要

Preparation and characterization of ultrananocrystalline diamond films in H2/Ar/CH4 gas mixtures system with novel filament structure

来源期刊:中南大学学报(英文版)2015年第11期

论文作者:FENG Jie LI Sha-sha LUO Hao WEI Qiu-ping WANG Bing LI Jian-guo HU Dong-ping MEI Jun YU Zhi-ming

文章页码:4097 - 4104

Key words:ultrananocrystalline diamond; hot filament chemical vapor deposition (HFCVD); nano-mechanics properties; bistratal filament structure

Abstract: Diamond films were prepared by hot filament chemical vapor deposition (HFCVD) in a gas mixtures system of methane, argon and hydrogen. The composition and morphology in different deposition pressures and filament structures were investigated, as well as the friction and wear-resistant properties. The sp3-bonded content was measured and nano-mechanics properties were also tested. Results of atomic force microscopy and X-ray photoelectron spectroscopy show that the diamond films whose surface roughness is less than 10 nm and sp3-bonded content is greater than 70% can be prepared by bistratal filament structure with optimized proportion of Ar. It is also shown that the friction coefficient of diamond films is 0.13 and its wear-resistant property is excellent. Nano-mechanics of films shows that its elastic modulus is up to 650 MPa and hardness can reach higher than 60 GPa. The diamond films with excellent performance have a broad application prospect in microelectromechanical systems (MEMS).

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Preparation and characterization of ultrananocrystalline diamond films in H2/Ar/CH4 gas mixtures system with novel filament structure

FENG Jie(丰杰)1,2, LI Sha-sha(李莎莎)1, LUO Hao(罗浩)1, WEI Qiu-ping(魏秋平)1,3, WANG Bing(王兵)4, LI Jian-guo(李建国)2, HU Dong-ping(胡东平)2, MEI Jun(梅军)2, YU Zhi-ming(余志明)1,3

(1. School of Materials Science and Engineering, Central South University, Changsha 410083, China;
2. Institute of Systems Engineering, China Academy of Engineering Physics, Mianyang 621900, China;
3. State Key Laboratory of Powder Metallurgy (Central South University), Changsha 410083, China;
4. School of Materials Science and Engineering, Southwest University of Science and Technology,
Mianyang 621010, China)

Abstract:Diamond films were prepared by hot filament chemical vapor deposition (HFCVD) in a gas mixtures system of methane, argon and hydrogen. The composition and morphology in different deposition pressures and filament structures were investigated, as well as the friction and wear-resistant properties. The sp3-bonded content was measured and nano-mechanics properties were also tested. Results of atomic force microscopy and X-ray photoelectron spectroscopy show that the diamond films whose surface roughness is less than 10 nm and sp3-bonded content is greater than 70% can be prepared by bistratal filament structure with optimized proportion of Ar. It is also shown that the friction coefficient of diamond films is 0.13 and its wear-resistant property is excellent. Nano-mechanics of films shows that its elastic modulus is up to 650 MPa and hardness can reach higher than 60 GPa. The diamond films with excellent performance have a broad application prospect in microelectromechanical systems (MEMS).

Key words:ultrananocrystalline diamond; hot filament chemical vapor deposition (HFCVD); nano-mechanics properties; bistratal filament structure

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