Amorphous forming ability of Co-X（X=Cr,Mo,W） magnetic thin films

Gaowu QIN,Na XIAO,Bo YANG,Yuping REN,Wenli PEI and Xiang ZHAO Key Laboratory for Anisotropy and Texture of Materials(Ministry of Education),Northeastern University,Shenyang 110004,China

摘 要：Co-X（X=Cr,Mo,W） magnetic thin films were prepared by using DC magnetron sputtering,and their structures were examined by using X-ray diffraction（XRD）.The amorphous forming ability（AFA） of the three alloy systems was discussed based on thermodynamic calculation and experiments.The results show that the Co-Mo thin films exhibit the largest AFA among them,and the Co-W thin films are conditiondependent amorphous while the Co-Cr thin films are hard to be amorphous,which is consistent with the thermodynamic calculation.The difference in AFA for the alloys of these three systems is finally ascribed to three main factors:differences in electronegativity,electron density and atomic size between Co and X elements.

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