Synthesis and Properties of UV-curable Hyperbranched Polyurethane and Its Application in the Negative-type Photoresist
来源期刊：Journal Of Wuhan University Of Technology Materials Science Edition2014年第1期
论文作者：刘敬成 LIN Licheng JIA Xiuli LIU Ren ZHANG Shengwen 刘晓亚
文章页码：208 - 212
摘 要：UV-curable hyperbranched polyurethane（UV-HBPU） containing carboxyl groups was synthesized from isophorone diisocyanate（IPDI）, diethanolamine（DEOA）, polyethylene glycol（PEG-400）, hydroxyethyl acrylate（HEA）, and 2,2-bis（hydroxymethyl） propionic acid（DMPA）. The UV-HBPU was used as a negative-type photoresist for a printed circuit board（PCB）. Fourier-transform infrared spectroscopy（FTIR） and proton nuclear magnetic resonance（1HNMR） spectroscopy of UV-HBPUs indicated that the synthesis was successful. Differential scanning calorimetry（DSC） and thermogravimetric analysis（TGA） showed that the thermal stability of the UV-HBPUs decreased as the HEA content increased. The polymer exhibited excellent photoresist properties, and the resolution of circuits based on this negative-type photoresist reached 10 μm.
刘敬成，LIN Licheng，JIA Xiuli，LIU Ren，ZHANG Shengwen，刘晓亚
School of Chemical and Material Engineering, Jiangnan University
摘 要：UV-curable hyperbranched polyurethane（UV-HBPU） containing carboxyl groups was synthesized from isophorone diisocyanate（IPDI）, diethanolamine（DEOA）, polyethylene glycol（PEG-400）, hydroxyethyl acrylate（HEA）, and 2,2-bis（hydroxymethyl） propionic acid（DMPA）. The UV-HBPU was used as a negative-type photoresist for a printed circuit board（PCB）. Fourier-transform infrared spectroscopy（FTIR） and proton nuclear magnetic resonance（1HNMR） spectroscopy of UV-HBPUs indicated that the synthesis was successful. Differential scanning calorimetry（DSC） and thermogravimetric analysis（TGA） showed that the thermal stability of the UV-HBPUs decreased as the HEA content increased. The polymer exhibited excellent photoresist properties, and the resolution of circuits based on this negative-type photoresist reached 10 μm.
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