Structural and optical properties of tellurium films obtained by chemical vapor deposition(CVD)

来源期刊:中国有色金属学报(英文版)2006年第3期

论文作者:马玉天 龚竹青 徐卫红 黄坚

文章页码:693 - 699

Key words:tellurium thin film; chemical vapor deposition; solar radiation shields; radiative cooling

Abstract: Tellurium thin films were prepared by the chemical vapor deposition method. The structure, surface morphology and optical properties of the Te thin films were analyzed by powder X-ray diffraction, scanning electron microscopy, FTIR transmission, UV/VIS/NIR transmission and reflectance. The results show that the films structural and optical properties are influenced by many factors such as film thickness, crystallite size and substrate temperature. The films as thick as 111-133 nm have high IR transmission across the full 8-13 μm band and highly blocking in the solar spectral region elsewhere, which indicates that Te films thickness in this region can be used as good solar radiation shields in radiative cooling devices.

基金信息:the National Natural Science Foundation of China

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