轴对称磁场对电弧离子镀TiN薄膜结构及摩擦性能的影响

来源期刊：金属学报2011年第5期

论文作者：肖金泉 郎文昌 赵彦辉 宫骏 孙超 闻立时

文章页码：566 - 572

关键词：轴对称磁场； 电弧离子镀； 大颗粒； 组织结构； 摩擦性能

Key words：axisymmetric magnetic field； arc ion plating； macroparticle； microstructure； friction performance

摘    要：利用轴对称磁场增强电弧离子镀工艺制备TiN薄膜,对薄膜表面大颗粒尺寸、数量及大颗粒与薄膜的面积比进行了分析统计,研究了轴对称磁场横向分量强度对薄膜表面大颗粒尺寸和数量、薄膜组织结构及摩擦性能的影响,结果表明,随着轴对称磁场横向分量强度的增加,大颗粒的尺寸和数量大幅度减少,不同尺寸大颗粒的形貌差别很大,TiN薄膜的(111)择优取向增强,薄膜的晶粒尺寸减小且分布均匀:同时,薄膜的摩擦系数及其随时间的波动减小,耐磨性增强.

Abstract: Arc ion plating (AIP)has been widely used in the deposition of various kinds of thin solid films.In AIP process,cathode spot motion is the key factor because it affects the physical characteristics of arc plasma,the utilization of cathode materials,the ejection of macroparticles (MPs) and the quality of subsequent films.It has been found that the cathode spot can be steered by an external magnetic field,such as an axisymmetric magnetic field(AMF).In this work,a new AMF produced by using an adjustable electromagnetic coil associated with a concentric magnetic flux guider was applied to the cathode surface to deposit TiN films,and it was focused on the influence of the AMF on the content and size of MPs,microstructure and friction performance of TiN films.The results show that the size and number of MPs decrease significantly with the increase in the transverse component of AMF.Meanwhile,the TiN film (111) preferred orientation enhances and its grain size decreases. Furthermore,the friction coefficient of films reduces and the wear resistance of films increases.