微量Ga对高压阳极铝箔腐蚀发孔性能的影响
来源期刊：中南大学学报(自然科学版)2012年第11期
论文作者：朱兵 陈明安 张新明 林林 卢敬华 陈文 牟春
文章页码：4211 - 4219
关键词：高压阳极铝箔；Ga；表面处理；点蚀电位；腐蚀发孔性能
Key words：high voltage anode aluminum foil; Ga; surface treatment; pitting potential; pitting ability
摘 要：采用金相显微镜和扫描电镜观察腐蚀形貌，结合动电位极化曲线测试点蚀电位，研究微量Ga对高压阳极铝箔腐蚀发孔性能的影响。结果表明，含Ga铝箔经退火后，点蚀电位约为-0.85V，比退火态不含Ga铝箔的点蚀电位负移约80 mV；退火后Ga在铝箔表面发生富集，增强了铝箔在含氯离子溶液中的点蚀倾向。当Ga含量 20×10-6时，铝箔腐蚀区面积比约98%，腐蚀区内蚀坑数量众多、分布均匀，扩面效果显著；Ga含量达到80×10-6时，虽然腐蚀区面积比高，但腐蚀区内局部区域形成粗大蚀坑，腐蚀均匀性有所降低。因此，添加适量Ga可显著改善铝箔在HCl-H2SO4溶液中的腐蚀发孔性能。
Abstract: The influence of trace Ga on the pitting performance of aluminum foils was investigated. The distribution of pits and the morphological features of anode foils after pit etching were observed by metallographic microscopy and scanning electron microscopy, and the galvano-chemistry performance of foils was analyzed by using potentiodynamic polarization. The results indicate that heat treatment of Ga-contained foils at 813 K for 1 h makes the pitting potential shift negatively to about -0.85 V, which is 80 mV lower than that of the annealed Ga-free foil, and Ga segregate to the surface. As a results, the susceptibility to pitting corrosion of foils in Cl--contained solution is promoted. After pit etching, high ratio of corrosion area about 98% and high density of relatively uniformly distributed pits are obtained for the foil with about 20×10-6 Ga, while some huge pits form and the homogeneity of pitting corrosion decreases when the content of Ga reaches 80×10-6. Consequently, Ga, as an eco-friendly element, can be applied with a proper quantity to improve the homogeneous pitting ability of high voltage anode aluminum foil.
朱兵1，陈明安1，张新明1，林林2，卢敬华2，陈文2，牟春2
(1.中南大学 材料科学与工程学院，湖南 长沙，410083；
2. 西南铝业(集团)有限责任公司，重庆，401326)
摘 要：采用金相显微镜和扫描电镜观察腐蚀形貌，结合动电位极化曲线测试点蚀电位，研究微量Ga对高压阳极铝箔腐蚀发孔性能的影响。结果表明，含Ga铝箔经退火后，点蚀电位约为-0.85V，比退火态不含Ga铝箔的点蚀电位负移约80 mV；退火后Ga在铝箔表面发生富集，增强了铝箔在含氯离子溶液中的点蚀倾向。当Ga含量 20×10-6时，铝箔腐蚀区面积比约98%，腐蚀区内蚀坑数量众多、分布均匀，扩面效果显著；Ga含量达到80×10-6时，虽然腐蚀区面积比高，但腐蚀区内局部区域形成粗大蚀坑，腐蚀均匀性有所降低。因此，添加适量Ga可显著改善铝箔在HCl-H2SO4溶液中的腐蚀发孔性能。
关键词：高压阳极铝箔；Ga；表面处理；点蚀电位；腐蚀发孔性能
ZHU Bing1, CHEN Ming-an1, ZHANG Xin-ming1, LIN Lin2, LU Jing-hua2, CHEN Wen2, MOU Chun2
(1. School of Materials Science and Engineering, Central South University, Changsha 410083, China;
2. Southwest Aluminum (Group) Limited Company, Chongqing 401326, China)
Abstract:The influence of trace Ga on the pitting performance of aluminum foils was investigated. The distribution of pits and the morphological features of anode foils after pit etching were observed by metallographic microscopy and scanning electron microscopy, and the galvano-chemistry performance of foils was analyzed by using potentiodynamic polarization. The results indicate that heat treatment of Ga-contained foils at 813 K for 1 h makes the pitting potential shift negatively to about -0.85 V, which is 80 mV lower than that of the annealed Ga-free foil, and Ga segregate to the surface. As a results, the susceptibility to pitting corrosion of foils in Cl--contained solution is promoted. After pit etching, high ratio of corrosion area about 98% and high density of relatively uniformly distributed pits are obtained for the foil with about 20×10-6 Ga, while some huge pits form and the homogeneity of pitting corrosion decreases when the content of Ga reaches 80×10-6. Consequently, Ga, as an eco-friendly element, can be applied with a proper quantity to improve the homogeneous pitting ability of high voltage anode aluminum foil.
Key words:high voltage anode aluminum foil; Ga; surface treatment; pitting potential; pitting ability
