简介概要

Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition

来源期刊:JOURNAL OF MATERIALS SCIENCE TECHNOLOG2017年第3期

论文作者:Eun-Young Yun Woo-Jae Lee Qi Min Wang Se-Hun Kwon

文章页码:295 - 299

摘    要:Titanium-aluminum-nitride(TiAlN) films were grown by plasma-enhanced atomic layer deposition(PEALD)on 316 L stainless steel at a deposition temperature of 200 °C. A supercycle, consisting of one AlN and ten TiN subcycles, was used to prepare TiAlN films with a chemical composition of Ti0.25Al0.25N0.50. The addition of AlN to TiN resulted in an increased electrical resistivity of TiAlN films of 2800 μΩ cm, compared with 475 μΩ cm of TiN films, mainly due to the high electrical resistivity of AlN and the amorphous structure of TiAlN. However, potentiostatic polarization measurements showed that amorphous TiAlN films exhibited excellent corrosion resistance with a corrosion current density of 0.12 μA/cm2, about three times higher than that of TiN films, and about 12.5 times higher than that of 316 L stainless steel.

详情信息展示

Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition

Eun-Young Yun1,Woo-Jae Lee1,Qi Min Wang2,Se-Hun Kwon1

1. School of Materials Science and Engineering, Pusan National University2. School of Electromechanical Engineering, Guangdong University of Technology

摘 要:Titanium-aluminum-nitride(TiAlN) films were grown by plasma-enhanced atomic layer deposition(PEALD)on 316 L stainless steel at a deposition temperature of 200 °C. A supercycle, consisting of one AlN and ten TiN subcycles, was used to prepare TiAlN films with a chemical composition of Ti0.25Al0.25N0.50. The addition of AlN to TiN resulted in an increased electrical resistivity of TiAlN films of 2800 μΩ cm, compared with 475 μΩ cm of TiN films, mainly due to the high electrical resistivity of AlN and the amorphous structure of TiAlN. However, potentiostatic polarization measurements showed that amorphous TiAlN films exhibited excellent corrosion resistance with a corrosion current density of 0.12 μA/cm2, about three times higher than that of TiN films, and about 12.5 times higher than that of 316 L stainless steel.

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