Kinetic process of oxidative leaching of chalcopyriteunder low oxygen pressure and low temperature

来源期刊:中国有色金属学报(英文版)2007年第2期

论文作者:邱廷省 聂光华 王俊峰 崔立凤

文章页码:418 - 418

Key words:chalcopyrite; kinetics; pressure oxidation; sodium chloride hydroxide medium; leaching

Abstract: Kinetic process of oxidative leaching of chalcopyrite in chloride acid hydroxide medium under oxygen pressure and low temperature was investigated. The effect on leaching rate of chalcopyrite caused by these factors such as ore granularity, vitriol concentration, sodium chloride concentration, oxygen pressure and temperature was discussed. The results show that the leaching rate of chalcopyrite increases with decreasing the ore granularity. At the early stage of oxidative reaction, the copper leaching rate increases with increasing the oxygen pressure and dosage of vitriol concentration, while oxygen pressure affects leaching less at the later stage. At low temperature, the earlier oxidative leaching process of chalcopyrite is controlled by chemical reactions while the later one by diffusion. The chalcopyrite oxidative leaching rate has close relation with ion concentration in the leaching solution. The higher ion concentration is propitious for chalcopyrite leaching.

基金信息:the National Natural Science Foundation of China
the Natural Science Foundation of Jiangxi Province, China

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