等离子复合处理制备光催化N掺杂TiO2薄膜

来源期刊:中国有色金属学报(英文版)2012年第z1期

论文作者:王鹤峰 树学峰 李秀燕 唐 宾

文章页码:120 - 126

关键词:TiO2;N掺杂;光催化;不锈钢;等离子表面合金化

Key words:TiO2; N doping; photocatalysis; stainless steel; plasma alloying

摘    要:通过等离子合金化技术在不锈钢表面制备TiN薄膜,然后对TiN薄膜进行热氧化得到N掺杂TiO2薄膜。同时制备TiO2薄膜作为对比研究。利用X射线衍射(XRD)、X 射线光电子能谱(XPS)、扫描电子显微镜(SEM)及紫外-可见分光光度仪(UV-Vis)对得到的薄膜进行表征。XRD 测试结果表明:经过450 °C氧化处理的薄膜中存在锐钛矿晶型的TiO2。经热氧化后薄膜表面均匀分布着尺寸接近的微小凸起物。TiO2和N掺杂TiO2的带隙分别为 3.25 eV和3.08 eV。可见光下薄膜催化剂降解亚甲基蓝溶液的实验结果表明:N掺杂TiO2薄膜比未掺杂TiO2薄膜的光催化效率明显高,可见光照射150 min后对亚甲基蓝溶液的最终降解率为20%。

Abstract: Nitrogen doped titanium dioxide (N-TiO2) coatings were fabricated by oxidation of the TiNx coatings in air. TiNx coatings were prepared on stainless steel (SS) substrates by plasma surface alloying technique. The reference TiO2 sample was also deposited by oxidation of the Ti coatings in air. The as-prepared coatings were characterized by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM) and ultra violet-visible absorption spectroscopy (UV-Vis). The formation of anatase type TiO2 is confirmed by XRD. SEM measurement indicates a rough surface morphology with sharp, protruding modules after annealing treatment. The band gap of the N-doped sample is reduced from 3.25 eV to 3.08 eV compared with the undoped one. All the N-doped samples show red shift in photoresponse towards visible region and improved photocurrent density under visible irradiance is observed for the N-doped samples. The photocatalytic activity was evaluated via the photocatalytic oxidation of methylene blue (MB) in aqueous under visible light irradiation. The results reveal that the N-doped samples extend the light absorption spectrum toward the visible region. The degradation rate of N-TiO2 is 20% in visible irradiation for 150 min.

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