THE EFFECTS OF NEGATIVE BIAS AND FLUX RATIO ON THE PROPERTIES OF TiN THIN FILMS FORMED BY FILTERED CATHODIC ARC PLASMA TECHNIQUE
来源期刊：Acta Metallurgica Sinica2005年第3期
论文作者：J.Wang W.W. Zhang Z.G. Wu Q.J. Xue Y.J.Zhang P.X. Yan
Key words：TiN; filtered cathodic arc plasma; preferred orientation;
Abstract: The filtered cathodic vacuum-arc (FCVA) technique is a supplementary and alternative technique with respect to convendtional physical and chemical vapour deposition which can remove macro-particles effectively and make the deposition process at ambient temperature.In this work, high quality TiN thin films were deposited on silicon substrates at low temperature using the improved filtered cathodic arc plasma (FCAP) technique. AFM, XRD, TEM were employed to characterize the TiN thin films. The effects of the negative substrate bias on the grain size, preferred crystalline orientation, surface roughness of TiN thin films were discussed.
J.Wang1，W.W. Zhang1，Z.G. Wu1，Q.J. Xue2，Y.J.Zhang1，P.X. Yan1
(1.Department of Physics, Lanzhou Universitry, Lanzhou 730000, China;
2.State Key Laboratory of Solid Lubrication, Institute of Chemical Physics, The Chinese Academy of Sciences, Lanzhou 730000, China)
Abstract:The filtered cathodic vacuum-arc (FCVA) technique is a supplementary and alternative technique with respect to convendtional physical and chemical vapour deposition which can remove macro-particles effectively and make the deposition process at ambient temperature.In this work, high quality TiN thin films were deposited on silicon substrates at low temperature using the improved filtered cathodic arc plasma (FCAP) technique. AFM, XRD, TEM were employed to characterize the TiN thin films. The effects of the negative substrate bias on the grain size, preferred crystalline orientation, surface roughness of TiN thin films were discussed.
Key words:TiN; filtered cathodic arc plasma; preferred orientation;
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