复杂高硅白合金硫酸氧化浸出工艺及提铜的动力学研究

来源期刊:中国有色金属学报2021年第5期

论文作者:吴选高 龚傲 喻小强 龙海军 徐志峰 田磊

文章页码:1358 - 1369

关键词:高硅白合金;硫酸氧化;浸出动力学;混合控制;收缩核模型

Key words:high silicon white alloy; sulfuric acid oxidation; leaching kinetics; hybrid control; shrinking core model

摘    要:研究了高硅白合金硫酸氧化体系下铜的浸出工艺与动力学。首先采用可控制变量法,通过单因素实验,系统研究了添加剂、硫酸浓度、反应温度、反应时间和液固比对铜钴浸出率的影响,其次通过X射线衍射(XRD)、电感耦合等离子体(ICP)和扫描电镜-能谱(SEM-EDS)对高硅白合金和浸出渣的物相及化学成分进行了分析对比。结果表明:在次氯酸钠用量5 mL、浸出温度343 K、反应时间5 h、硫酸浓度200 g/L、液固比7:1的工艺条件下,铜的浸出率可达99.42%,钴的浸出率可达到97.57%。最后,通过对高硅白合金硫酸氧化浸出提取铜的动力学模型的分析可知,活化能、硫酸浓度和粒度的反应级数分别为34.64 kJ/mol、2.34和0.18,表明其应遵循化学反应控制的收缩核模型,并建立了相应的动力学方程。

Abstract: The leaching process and kinetics of copper in high silicon white alloy sulfuric acid oxidation system were studied. Firstly, the effects of additives, sulfuric acid concentration, reaction temperature, reaction time and liquid-solid ratio on the leaching rate of copper and cobalt were systematically studied by single factor experiment. Secondly, the phase and chemical composition of high silicon white alloy and leaching slag were analyzed by X-ray diffraction (XRD), inductively coupled plasma (ICP) and scanning electron microscopy (SEM-EDS). The results show that the copper and cobalt leaching rate reach 99.42% and 97.57%, respectively, under the conditions of 5 mL in sodium hypochlorite, 343 K in leaching temperature, 5 h in reaction time, 200 g/L in sulfuric acid concentration and 7:1 in liquid-solid ratio. Finally, by analyzing the kinetic model of copper extraction from high silicon white alloy by sulfuric acid oxidation leaching, the activation energy, sulfuric acid concentration and particle size reaction order are 34.64 kJ/mol, 2.34 and 0.18, respectively, indicating that it should follow the chemical reaction control of shrinking core model, and establish the corresponding kinetic equation finally.

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